Noble metals (Ir, Pt) films were prepared by MOCVD using metal-acetylacetonate precursors. The effects of deposition conditions on deposition rates, composition and microstructure were studied, and the optimum conditions were determined. A small amount of oxygen addition to the source gas was effective to prepare high-purity films. Epitaxially grown films were obtained on several kinds of single crystalline substrates. Black-colored powdery films containing impurity carbon were prepared without oxygen addition. These black films consists of fine particles about several nanometer in size. Ir films prepared without oxygen addition showed superior electrical and catalytic properties as an electrode for zirconia solid electrolytes particularly ...
A new heteroleptic Ir(I) compound exhibiting high volatility and defined thermal decomposition under...
Some new volatile bis-cyclopentadienyl zirconium alkoxides of the type Cp2Zr(OR)(OtBu) (R = iPr, Et,...
In the present work, we report the deposition of zirconia thin films on Si(100) at various substrate...
Noble metals (Ir, Pt) films were prepared by MOCVD using metal-acetylacetonate precursors. The effec...
Noble metals are widely used as electrodes in gas sensors because of their unique physical and chemi...
Physical properties and deposition characteristics of a newly developed liquid iridium precursor Ir(...
The syntheses of three volatile IrI cyclooctadiene precursors is described. The anionic ligand was c...
[[abstract]]The syntheses of three volatile Ir-1 cyclooctadiene precursors is described. The anionic...
[[abstract]]The syntheses of three volatile Ir-1 cyclooctadiene precursors is described. The anionic...
The request for electrodes exhibiting satisfactory catalytic activity and high stability, under part...
A new one step synthesis of a volatile iridium OMCVD precursor with 60 % yield is described. Using t...
Parallel to successful studies into use of [ZrCp'{¿ 2-(iPrN)2CNMe2} 2Cl] as a precursor to the depos...
High quality and purity Pt thin films were deposited using, as precursors, both platinum (II) acetyl...
Thin films of metal oxides are finding an increasing application in electronic devices. They can be ...
er, th abov es of aller c d oxi 953 # A eived used Pt electrodes for ferroelectric and high-dielectr...
A new heteroleptic Ir(I) compound exhibiting high volatility and defined thermal decomposition under...
Some new volatile bis-cyclopentadienyl zirconium alkoxides of the type Cp2Zr(OR)(OtBu) (R = iPr, Et,...
In the present work, we report the deposition of zirconia thin films on Si(100) at various substrate...
Noble metals (Ir, Pt) films were prepared by MOCVD using metal-acetylacetonate precursors. The effec...
Noble metals are widely used as electrodes in gas sensors because of their unique physical and chemi...
Physical properties and deposition characteristics of a newly developed liquid iridium precursor Ir(...
The syntheses of three volatile IrI cyclooctadiene precursors is described. The anionic ligand was c...
[[abstract]]The syntheses of three volatile Ir-1 cyclooctadiene precursors is described. The anionic...
[[abstract]]The syntheses of three volatile Ir-1 cyclooctadiene precursors is described. The anionic...
The request for electrodes exhibiting satisfactory catalytic activity and high stability, under part...
A new one step synthesis of a volatile iridium OMCVD precursor with 60 % yield is described. Using t...
Parallel to successful studies into use of [ZrCp'{¿ 2-(iPrN)2CNMe2} 2Cl] as a precursor to the depos...
High quality and purity Pt thin films were deposited using, as precursors, both platinum (II) acetyl...
Thin films of metal oxides are finding an increasing application in electronic devices. They can be ...
er, th abov es of aller c d oxi 953 # A eived used Pt electrodes for ferroelectric and high-dielectr...
A new heteroleptic Ir(I) compound exhibiting high volatility and defined thermal decomposition under...
Some new volatile bis-cyclopentadienyl zirconium alkoxides of the type Cp2Zr(OR)(OtBu) (R = iPr, Et,...
In the present work, we report the deposition of zirconia thin films on Si(100) at various substrate...