Un spectromètre à rayon x à incidence rasante utilisant un tube à rayon x standard et un détecteur solide au germanium a été construit pour un balayage de diffraction vertical et horizontal, et des mesures de fluorescence sous incidence rasante. Il a été utilisé pour étudier des films minces de nitrure de titane obtenus dans différentes conditions de stoechiométrie, compression, dimension des grains, orientation et paramètre cristallins. En particulier, des films obtenus à la température de l'azote liquide du substrat montrent des états très comprimés, indépendants du matériau de support. Des films obtenus à la température ordinaire et au dessus ont des lignes de diffraction plus étroites, des orientations préférentielles et des tensions de...
An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Exte...
TI e technology of hard coatings based on stoichiometric titanium nitride thin films has been inovat...
TiN films were deposited directly on Cu substrates by a cathodic are plasma deposition technique. Th...
International audienceRefractory transition metal nitrides are attracting attention in many microele...
Une série de films Ti1-xAlxN (0 ≤ x ≤ 1, teneur en Al) de différentes épaisseurs (300 – 500 et ≃ 200...
Titanium nitride thin films were deposited by atmospheric chemical vapour deposition in the temperat...
International audienceThin films of Ti1−xAlxN nitrides were prepared over a large range of compositi...
International audienceTelluride films are widely applied in data storage devices (advanced resistive...
The first part of the study is concerned with the ability of the reduced incidence X-ray diffraction...
The structural properties of thin Ti films were studied by x ray scattering techniques aiming at an ...
The structural properties of thin Ti films were studied by x-ray scattering techniques aiming at an ...
Abstract: Titanium nitride thin films deposited by reactive dc magnetron sputtering under various su...
*Investigation on the formation of titanium nitride thin films on 304 type stainless steel using pla...
This paper reports on the characterization of films of titanium nitride (TiN) obtained by reactive s...
This thesis deals with the deposition, characterisation and optical study of thin films coatings des...
An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Exte...
TI e technology of hard coatings based on stoichiometric titanium nitride thin films has been inovat...
TiN films were deposited directly on Cu substrates by a cathodic are plasma deposition technique. Th...
International audienceRefractory transition metal nitrides are attracting attention in many microele...
Une série de films Ti1-xAlxN (0 ≤ x ≤ 1, teneur en Al) de différentes épaisseurs (300 – 500 et ≃ 200...
Titanium nitride thin films were deposited by atmospheric chemical vapour deposition in the temperat...
International audienceThin films of Ti1−xAlxN nitrides were prepared over a large range of compositi...
International audienceTelluride films are widely applied in data storage devices (advanced resistive...
The first part of the study is concerned with the ability of the reduced incidence X-ray diffraction...
The structural properties of thin Ti films were studied by x ray scattering techniques aiming at an ...
The structural properties of thin Ti films were studied by x-ray scattering techniques aiming at an ...
Abstract: Titanium nitride thin films deposited by reactive dc magnetron sputtering under various su...
*Investigation on the formation of titanium nitride thin films on 304 type stainless steel using pla...
This paper reports on the characterization of films of titanium nitride (TiN) obtained by reactive s...
This thesis deals with the deposition, characterisation and optical study of thin films coatings des...
An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Exte...
TI e technology of hard coatings based on stoichiometric titanium nitride thin films has been inovat...
TiN films were deposited directly on Cu substrates by a cathodic are plasma deposition technique. Th...