Les défauts créés par un traitement à basse température du silicium Czochralski avec une teneur élevée en oxygène, sont étudiés par microscopie électronique à haute tension et à haute résolution.The defects formed during a low temperature treatment of Czochralski silicon with a high interstitial oxygen content are studied by both high voltage and high resolution electron microscopy
An oxygen precipitation phenomenon was evidenced on high energy implanted Czochralski silicon sample...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
Smal l defects in Czochralski silicon substrates are responsible for defect generation in oxide laye...
Les défauts créés par un traitement à basse température du silicium Czochralski avec une teneur élev...
Defects in oxygen-containing Czochralski silicon (Cz-Si) subjected to 2-steps pre-annealing at 720–...
Defects in oxygen-containing Czochralski silicon (Cz-Si) subjected to 2-steps pre-annealing at 720–...
It is shown by electrical property measurements that extended annealing at 450 ~ introduced-> 101...
Abstract. We report studies of defects in electron-irradiated Czochralski-grown silicon (Cz-Si) subj...
Infrared absorption studies of defect formation in Czochralski silicon irradiated with fast electron...
The role of oxygen concentration on the formation/evolution of residual defects in implanted and rap...
The focus of this master's thesis has been the formation of oxygen-related defects in the last 10 cm...
This paper emphasizes that the furnace pressure, crucible rotation, and pulling rate have important ...
Abstract The structure and morphology of epitaxial layer defects in epitaxial Si wafers produced by ...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
An oxygen precipitation phenomenon was evidenced on high energy implanted Czochralski silicon sample...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
Smal l defects in Czochralski silicon substrates are responsible for defect generation in oxide laye...
Les défauts créés par un traitement à basse température du silicium Czochralski avec une teneur élev...
Defects in oxygen-containing Czochralski silicon (Cz-Si) subjected to 2-steps pre-annealing at 720–...
Defects in oxygen-containing Czochralski silicon (Cz-Si) subjected to 2-steps pre-annealing at 720–...
It is shown by electrical property measurements that extended annealing at 450 ~ introduced-> 101...
Abstract. We report studies of defects in electron-irradiated Czochralski-grown silicon (Cz-Si) subj...
Infrared absorption studies of defect formation in Czochralski silicon irradiated with fast electron...
The role of oxygen concentration on the formation/evolution of residual defects in implanted and rap...
The focus of this master's thesis has been the formation of oxygen-related defects in the last 10 cm...
This paper emphasizes that the furnace pressure, crucible rotation, and pulling rate have important ...
Abstract The structure and morphology of epitaxial layer defects in epitaxial Si wafers produced by ...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
An oxygen precipitation phenomenon was evidenced on high energy implanted Czochralski silicon sample...
This contribution reports the study, by junction spectroscopies, of electronic states induced by the...
Smal l defects in Czochralski silicon substrates are responsible for defect generation in oxide laye...