Ce papier décrit un système d'automatisation pour la mesure des largeurs des rubans des circuits intégrés à l'aide d'un microscope électronique à balayage.This paper describes a system which automates integrated circuit linewidths measurements in an electron microscope
A linewidtdh metrology based on electron optical methods has been developed and applicated to X-ray ...
This thesis was conducted to provide an automated method for characterization of printed electronics...
The magnification factor in transmission electron microscopy is not very precise, hampering for inst...
Present scanning electron microscopy (SEM) linewidth measurement systems, although state of the art...
L'accroissement de la densité d'intégration des circuits intégrés exige des moyens de contrôle d'une...
As modern technologies become ever more complex, a premium is placed on miniaturization and space-sa...
Conventional scalar imaging theory has been used successfully to provide measurements of linewidths ...
The evolution of integrated circuit dimensions into the submicron region for the Very Large Scale In...
One of the most important steps in the extraction of layout for reverse engineering of the integrate...
This paper discusses research on an automatic focusing system for IC-linewidth measuring instruments...
As optical lithography advances toward the 10 nm mark, much effort is being expended to push electro...
The measurement of line widths optically allows fast, easy non-contact measurements and finds applic...
This paper describes an electrical measurement method using a cross-bridge t st structure to evaluat...
In this thesis, we investigate the complex problem of designing an integrated circuit inspection sys...
Collection of linewidth data is an important part of photoresist characterization. Linewidth data ar...
A linewidtdh metrology based on electron optical methods has been developed and applicated to X-ray ...
This thesis was conducted to provide an automated method for characterization of printed electronics...
The magnification factor in transmission electron microscopy is not very precise, hampering for inst...
Present scanning electron microscopy (SEM) linewidth measurement systems, although state of the art...
L'accroissement de la densité d'intégration des circuits intégrés exige des moyens de contrôle d'une...
As modern technologies become ever more complex, a premium is placed on miniaturization and space-sa...
Conventional scalar imaging theory has been used successfully to provide measurements of linewidths ...
The evolution of integrated circuit dimensions into the submicron region for the Very Large Scale In...
One of the most important steps in the extraction of layout for reverse engineering of the integrate...
This paper discusses research on an automatic focusing system for IC-linewidth measuring instruments...
As optical lithography advances toward the 10 nm mark, much effort is being expended to push electro...
The measurement of line widths optically allows fast, easy non-contact measurements and finds applic...
This paper describes an electrical measurement method using a cross-bridge t st structure to evaluat...
In this thesis, we investigate the complex problem of designing an integrated circuit inspection sys...
Collection of linewidth data is an important part of photoresist characterization. Linewidth data ar...
A linewidtdh metrology based on electron optical methods has been developed and applicated to X-ray ...
This thesis was conducted to provide an automated method for characterization of printed electronics...
The magnification factor in transmission electron microscopy is not very precise, hampering for inst...
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