Plasma Etching Of Polycrystalline Silicon Films Using Chlorine Based Mixtures For Fabrication Of Infrared Sensors And Mos Gates

Image sensors based on Active Pixel Sensor (APS) and fabricated employing a simple MOS technology are used in a fast growing number of applications. Large feature size is used to offer high photodetection sensitivity and low cost. This kind of sensors became very popular since the beginning of 90's. Here, for devices fabrication, plasma etching of Si with chlorine containing gas mixtures is employed which provides anisotropic etch with vertical walls, high uniformity and well controlled etch rate. ©2009IEEE.646649Makynen, A., Ruotsalainen, T., Kostarnovaara, J., (1997) Electronic Letters, 33, p. 2Sze, S.M., (1983) VLSI Technology, , McGRAWHill Internacional Editions, 2nd EditionSkotnicki, T., Jurczak, M., Martins, J., Paoli, M., Tormen, B., Pantel, R., Hernandez, C., Galvier, J., Well-controlled, selectively under-etched Si/SiGe gates for RF and high performance CMOS (2000) ST Microelectronics, , 850 rue J. Monnet, 38926 Crolles Cedex, FranceKim, T.W., Aydil, E.S., Effects of Chamber Wall Conditions on CI Concentration and Si Etch Rate Uniformity in Plasma Etching Reactors, , Department of Chemical Engineering, University of California, Santa Barbara, California 93106, USASatoa, M., Arita, Y., (1998) Control of Etching-product-dependent Shape and Selectivity in Gate Polysilicon Reactive Ion Etching, , NTT System Electronics Laboratories, 3-1, Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-301, JapanWolf, S., Tauber, R.N., (1986) Silicon Processing for the VLSI Era, , Process Technology. Lattice Press, CaliforniaDe Lima Monteiro, D.W., CMOS-based Integrated Wavefront Sensor (2002) DUP ScienceDe Lara, D.S., Ferreira, L.O.S., Swart, J.W., Advances in the Process and in the Methology od Emulsion Optical Masks Construction Proc. SBMICRO (2003), pp. 371-379Nunes, A.M., (2005) Corroso Por Plasma de Silicio Policristalino e Nitreto de Silcio para Tecnologias MENS e CMOS, , Tese de Mestrado, UNICAMP, Campinas - SPNunes, A.M., Plasma Etching for Polycrystalline Silicon Using Thinning Technology Application in Technologies MENS and CMOS (2007) Journal Integrated Circuits and Systems, 2, pp. 74-8