Highly fluorinated plasma polymers are chemically inert, acid resistant and have low friction coefficients, thereby being useful in chemical laboratories and for tribological applications. Here we report the plasma polymerization of ethylene-hexafluorobenzene mixtures by PECVD. The principal parameter of interest is the proportion of C6F6 in the feed, RF. Films were analyzed using near-normal and grazing-angle Infrared Reflection Absorption Spectroscopy (IRRAS), the latter being particularly useful for detecting modes not usually observed at near-normal incidence. The presence of CH and CFx (x = 1 to 2) groups was thus confirmed in films deposited with RF ≥ 40%. Depending on RF, IRRAS also revealed the presence of -CHx (x = 1 to 3) -C{doubl...
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantita...
The deposition and etching of plasma-polymerized fluorocarbon thin films were studied in filamentary...
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantita...
Highly fluorinated plasma polymers are chemically inert,acid resistant and have low friction coeffic...
Films were produced from trifluorotoluene/hydrogen (TFT/H2) and trifluorotoluene/tetrafluoromethane ...
Mixtures of C6H6 and SF6 were polymerized in an r.f. discharge. Actinometry (quantitative optical em...
Mixtures of C6H6 and SF6 were polymerized in an r.f. discharge. Actinometry (quantitative optical em...
This article reports on the deposition conditions and characterization of plasma polymerized fluoroc...
Thin films of fluorocarbon-based polymers can be deposited by plasma assisted polymerisation of vari...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilomet...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
Fluorinated films were deposited from radiofrequency discharges of toluene/trifluorotoluene and tolu...
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantita...
The deposition and etching of plasma-polymerized fluorocarbon thin films were studied in filamentary...
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantita...
Highly fluorinated plasma polymers are chemically inert,acid resistant and have low friction coeffic...
Films were produced from trifluorotoluene/hydrogen (TFT/H2) and trifluorotoluene/tetrafluoromethane ...
Mixtures of C6H6 and SF6 were polymerized in an r.f. discharge. Actinometry (quantitative optical em...
Mixtures of C6H6 and SF6 were polymerized in an r.f. discharge. Actinometry (quantitative optical em...
This article reports on the deposition conditions and characterization of plasma polymerized fluoroc...
Thin films of fluorocarbon-based polymers can be deposited by plasma assisted polymerisation of vari...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilomet...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
Polymerization processes in low-pressure plasmas used for industrial surface processing are surveyed...
Fluorinated films were deposited from radiofrequency discharges of toluene/trifluorotoluene and tolu...
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantita...
The deposition and etching of plasma-polymerized fluorocarbon thin films were studied in filamentary...
Polymer films were grown in rf discharges containing different proportions of C2H2 and SF6. Quantita...