This letter reports on the doping efficiency of nitrogen in a-Ge:H films of electronic quality. It has been found that nitrogen is an effective dopant in the a-Ge:H network, its doping efficiency being similar to the one corresponding to phosphorus in a-Si:H. The concentration of active nitrogen atoms decreases with impurity content following a square root dependence on total nitrogen. This behavior is similar to the one determined for column V dopants in a-Si:H films of electronic quality.621586
The Ge 3d core levels of sub-stoichiometric amorphous germanium-nitrogen (a-GeN) alloys are studied ...
The correlations between the defect density, N D, Fermi energy, E F, and Urbach tail, E 0, are exami...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties uch as high hardness, low mech...
This letter reports on the doping efficiency of nitrogen in a-Ge:H films of electronic quality. It h...
In this work the effects of nitrogen doping on the photoconductivity of hydrogenated amorphous germa...
This paper discusses experimental data referring to the electronic properties of N-doped hydrogenate...
In this work the effects of nitrogen doping on the photoconductivity of hydrogenated amorphous germa...
In this work experimental data referring to the structural and optoelectronic characteristics of amo...
In this work experimental data referring to the structural and optoelectronic characteristics of amo...
Hydrogenated amorphous germanium films have been p-type doped with indium and gallium. The room-temp...
The optoelectronic properties of Bi-doped hydrogenated amorphous germanium (a-Ge:H), with relative i...
High-electronic quality hydrogenated amorphous silicon-nitrogen (a-Si1-xNx: H) films with an energy ...
Recent experimental studies demonstrate a significant germanium (Ge) substrate loss and consequently...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties such as high hardness, low mec...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties such as high hardness, low mec...
The Ge 3d core levels of sub-stoichiometric amorphous germanium-nitrogen (a-GeN) alloys are studied ...
The correlations between the defect density, N D, Fermi energy, E F, and Urbach tail, E 0, are exami...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties uch as high hardness, low mech...
This letter reports on the doping efficiency of nitrogen in a-Ge:H films of electronic quality. It h...
In this work the effects of nitrogen doping on the photoconductivity of hydrogenated amorphous germa...
This paper discusses experimental data referring to the electronic properties of N-doped hydrogenate...
In this work the effects of nitrogen doping on the photoconductivity of hydrogenated amorphous germa...
In this work experimental data referring to the structural and optoelectronic characteristics of amo...
In this work experimental data referring to the structural and optoelectronic characteristics of amo...
Hydrogenated amorphous germanium films have been p-type doped with indium and gallium. The room-temp...
The optoelectronic properties of Bi-doped hydrogenated amorphous germanium (a-Ge:H), with relative i...
High-electronic quality hydrogenated amorphous silicon-nitrogen (a-Si1-xNx: H) films with an energy ...
Recent experimental studies demonstrate a significant germanium (Ge) substrate loss and consequently...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties such as high hardness, low mec...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties such as high hardness, low mec...
The Ge 3d core levels of sub-stoichiometric amorphous germanium-nitrogen (a-GeN) alloys are studied ...
The correlations between the defect density, N D, Fermi energy, E F, and Urbach tail, E 0, are exami...
Amorphous hydrogenated carbon (a-C:H) exhibits outstanding properties uch as high hardness, low mech...