Method For Measuring Ohmic Resistance Of Solution Layers At Gas-evolving Electrodes

A method for measuring ohmic resistance of solution layers at gas-evolving electrodes was developed and tested. The method was applied to hydrogen and oxygen-evolving electrodes, and the resistance of their adjacent solution layers (for a 9 mm electrode separator gap) causes a negligible IR drop. For 3 mm gaps at a current density of 300 mA/cm2, the IR drop of the solution layer increases to 25 mV. Contact resistance at the various electrode connections are shown to have a measurable contribution which increases with electrolysis time.13841028103