Carbon nitride films (CN x) have been deposited by sputtering a graphite target with nitrogen ions. Films were grown both with and without the presence of an assisting focused N 2 ion beam. The sputter beam voltage was varied between 150 and 1500 V and the applied assisting beam voltage from 80 to 500 V. The substrate was held at fixed temperatures between 80 and 673 K. The coatings were characterized with respect to their electrical, optical, and structural properties. The nitrogen content was measured by x-ray photoelectron spectroscopy (XPS) and a maximum nitrogen concentration of 44 at. % was obtained for a nonassisted sample deposited at 140 K. The chemical structure was investigated by XPS and Fourier transform infrared spectroscopy. ...
Carbon nitride films were synthesized in a dual ion beam deposition facility by bombarding a growing...
Carbon nitride films were deposited at 20, 250 and 500C on 111: Si substrates by XeCl laser ablation...
A balanced planar r.f. powered magnetron sputter source has been used to deposit carbon nitride film...
Carbon nitride films (CNx) have been deposited by sputtering a graphite target with nitrogen ions. F...
Bombarding a carbon target with low-energy nitrogen ions causes the release of neutral carbon atoms ...
Carbon nitride films (CNx) were deposited by dual ion beam sputtering. A graphite target was sputter...
The purpose of this investigation was to establish a technique to deposit crystalline carbon nitride...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
The purpose of this investigation was to establish a technique to deposit crystalline carbon nitride...
The purpose of this investigation was to establish a technique to deposit crystalline carbon nitride...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
Carbonnitride films were synthesized by ionbeam assisted sputtering. A graphite target was sputtered...
The growth and microstructure evolution of carbon nitride CNx (0≤x≤0.35) films, deposited by reactiv...
Carbon nitride films were synthesized in a dual ion beam deposition facility by bombarding a growing...
Carbon nitride films were deposited at 20, 250 and 500C on 111: Si substrates by XeCl laser ablation...
A balanced planar r.f. powered magnetron sputter source has been used to deposit carbon nitride film...
Carbon nitride films (CNx) have been deposited by sputtering a graphite target with nitrogen ions. F...
Bombarding a carbon target with low-energy nitrogen ions causes the release of neutral carbon atoms ...
Carbon nitride films (CNx) were deposited by dual ion beam sputtering. A graphite target was sputter...
The purpose of this investigation was to establish a technique to deposit crystalline carbon nitride...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
The purpose of this investigation was to establish a technique to deposit crystalline carbon nitride...
The purpose of this investigation was to establish a technique to deposit crystalline carbon nitride...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
Carbon nitride films were deposited using a magnetron sputtering technique based on the Penning type...
Carbonnitride films were synthesized by ionbeam assisted sputtering. A graphite target was sputtered...
The growth and microstructure evolution of carbon nitride CNx (0≤x≤0.35) films, deposited by reactiv...
Carbon nitride films were synthesized in a dual ion beam deposition facility by bombarding a growing...
Carbon nitride films were deposited at 20, 250 and 500C on 111: Si substrates by XeCl laser ablation...
A balanced planar r.f. powered magnetron sputter source has been used to deposit carbon nitride film...