A study of ultraviolet and visible Raman spectroscopy was made in amorphous carbon nitride (a-C:Nx) and amorphous hydrogenated carbon nitride (a-C:Nx:H) thin films. Two growth techniques were used: 1) glow discharge was used for depositing hydrogenated films with diamond-like (at -200V of bias) and graphite-like (-800V of bias) structure and 2) ion beam assisted deposition (IBAD) to deposit non-hydrogenated films and to obtain high nitrogen concentrations (~30%). The difference in energy between the visible and UV Raman, the so called G dispersion parameter, was investigated for both series of films. This parameter brings additional information concerning the structure of the films regarding size and concentration of graphitic clusters, and...
Stoichiometry, bonding configurations and structural properties of plasma-deposited hydrogen-rich am...
The intrinsic stress, film density and nitrogen content of carbon nitride (CNx) films deposited from...
Amorphous carbon nitride films (a-CN x) with nitrogen concentration ranging from 0 to 30 at.% were p...
A study of ultraviolet and visible Raman spectroscopy was made in amorphous carbon nitride (a-C:Nx) ...
Amorphous carbon nitride films with N/C ratios ranging from 2.24 to 3.26 were deposited by reactive ...
Amorphous carbon nitride thin films (a-CNx) have been deposited onto Si ~100! substrates by using a ...
Microstructural investigations of a-C:H and a-CNx:H films obtained by plasma-enhanced CVD were perfo...
"Infrared and Raman spectroscopies have been used to characterize the presence of sp2 and sp3 bonds ...
Amorphous carbon nitride (a-C:N) films have been prepared on silicon(1 0 0) substrates by direct cur...
Amorphous hydrogenated carbon nitride films (a-C:H:N) deposited by plasma enhanced chemical vapor de...
International audienceAmorphous carbon nitride (a-C:N) material has attracted much attention in rese...
Si C N thin films were deposited by reactive magnetron sputtering on glass and steel substrates. The...
n the basis of ab initio calculations, the α, β- C3N4 crystalline compounds have been proposed as pr...
Hard a-C(N):H films were deposited onto Si(100) substrates by r.f. self-bias glow discharge in CH,-N...
Stoichiometry, bonding configurations and structural properties of plasma-deposited hydrogen-rich am...
The intrinsic stress, film density and nitrogen content of carbon nitride (CNx) films deposited from...
Amorphous carbon nitride films (a-CN x) with nitrogen concentration ranging from 0 to 30 at.% were p...
A study of ultraviolet and visible Raman spectroscopy was made in amorphous carbon nitride (a-C:Nx) ...
Amorphous carbon nitride films with N/C ratios ranging from 2.24 to 3.26 were deposited by reactive ...
Amorphous carbon nitride thin films (a-CNx) have been deposited onto Si ~100! substrates by using a ...
Microstructural investigations of a-C:H and a-CNx:H films obtained by plasma-enhanced CVD were perfo...
"Infrared and Raman spectroscopies have been used to characterize the presence of sp2 and sp3 bonds ...
Amorphous carbon nitride (a-C:N) films have been prepared on silicon(1 0 0) substrates by direct cur...
Amorphous hydrogenated carbon nitride films (a-C:H:N) deposited by plasma enhanced chemical vapor de...
International audienceAmorphous carbon nitride (a-C:N) material has attracted much attention in rese...
Si C N thin films were deposited by reactive magnetron sputtering on glass and steel substrates. The...
n the basis of ab initio calculations, the α, β- C3N4 crystalline compounds have been proposed as pr...
Hard a-C(N):H films were deposited onto Si(100) substrates by r.f. self-bias glow discharge in CH,-N...
Stoichiometry, bonding configurations and structural properties of plasma-deposited hydrogen-rich am...
The intrinsic stress, film density and nitrogen content of carbon nitride (CNx) films deposited from...
Amorphous carbon nitride films (a-CN x) with nitrogen concentration ranging from 0 to 30 at.% were p...