A novel cylindrical microwave plasma source

Microwave activated plasma shows advantages on obtaining high-density coatings with advanced mechanical properties, since these kinds of plasma allow to activate precursor molecules with high binding energy. We have developed a novel pulsed microwave plasma source, whose shape allows to obtain a large toroidal plasma emission zone, with a constant emission rate on the whole circumference of the emitting source. This design allows the deposition on relatively large and oddshaped samples. Plasma can be active on a large pressure range (10-2 /10 Torr), with a base pressure of 10-6 Torr to ensure a good purity for mechanical coatings. The microwave source was designed in order to fit on any kind of vacuum system equipped with a ISO standard 200 mm flange, regardless on the mounting direction. The pulsed microwave source uses a solid state power supply able to pulse the magnetron up to 8 kW peak, with a square waveform having excellent dynamic characteristic