An efficient method to accurately capture quantum confinement effects within Monte Carlo (MC) simulation while simultaneously resolving ‘ab initio’ ionized impurity scattering via the density gradient (DG) formalism is presented. The model is applied to study the impact of transport variability due to scattering from random discrete dopants on the on-current variability in realistic nano CMOS transistors. Such simulations result in an increase in drain current variability when compared with similarly quantum corrected drift diffusion (DD) simulation. Following this, an efficient three-stage hierarchical strategy is presented that propagates the increased on-current variability captured in 3D quantum corrected ‘ab initio’ MC into efficient 3...
Numerical simulations have been performed to study the single-charge-induced ON current fluctuations...
In this thesis, we explore the performance characteristics, speci cally the drain current drive, of ...
We study, using numerical simulation, the intrinsic parameter fluctuations in sub 10 nm gate length ...
Quantum corrections based on density gradient formalism, recently introduced in the 3-D Monte Carlo ...
In this work Random Discrete Dopant induced on-current variations have been studied using the Glasg...
A methodology for incorporating quantum corrections into self-consistent atomistic Monte Carlo (MC) ...
A comprehensive simulation study, of random-dopant-induced drain current variability is presented fo...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
This thesis is concerned with the Monte Carlo simulation of device parameter variation associated wi...
Intrinsic parameter fluctuations have become a very important problem for the scaling and integratio...
Abstract:- As the gate length of MOSFET devices shrinks down below 100 nm, the fluctuation of major ...
The scaling of conventional silicon based MOSFETs is increasingly difficult into the nanometer regim...
In this paper we present a detailed simulation study of the influence of quantum mechanical effects ...
In this paper, we study the impact of random discrete dopants in the source/drain (S/D) leads on the...
Numerical simulations have been performed to study the single-charge-induced ON current fluctuations...
In this thesis, we explore the performance characteristics, speci cally the drain current drive, of ...
We study, using numerical simulation, the intrinsic parameter fluctuations in sub 10 nm gate length ...
Quantum corrections based on density gradient formalism, recently introduced in the 3-D Monte Carlo ...
In this work Random Discrete Dopant induced on-current variations have been studied using the Glasg...
A methodology for incorporating quantum corrections into self-consistent atomistic Monte Carlo (MC) ...
A comprehensive simulation study, of random-dopant-induced drain current variability is presented fo...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
This thesis is concerned with the Monte Carlo simulation of device parameter variation associated wi...
Intrinsic parameter fluctuations have become a very important problem for the scaling and integratio...
Abstract:- As the gate length of MOSFET devices shrinks down below 100 nm, the fluctuation of major ...
The scaling of conventional silicon based MOSFETs is increasingly difficult into the nanometer regim...
In this paper we present a detailed simulation study of the influence of quantum mechanical effects ...
In this paper, we study the impact of random discrete dopants in the source/drain (S/D) leads on the...
Numerical simulations have been performed to study the single-charge-induced ON current fluctuations...
In this thesis, we explore the performance characteristics, speci cally the drain current drive, of ...
We study, using numerical simulation, the intrinsic parameter fluctuations in sub 10 nm gate length ...