Statistical variability associated with discreteness of charge and granularity of matter is one of limiting factors for CMOS scaling and integration. The major MOSFET statistical variability sources and corresponding physical simulations are discussed in detail. Direct statistical parameter extraction approach is presented and the scalability of 6T and 8T SRAM of bulk CMOS technology is investigated. The standard statistical parameter generation approaches are benchmarked and newly developed parameter generation approach based on nonlinear power method is outlined
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
Statistical device variability may be a limiting factor for further miniaturizing nodes in silicon b...
In this paper a variability-aware compact modeling strategy is presented for 20-nm bulk planar techn...
This paper presents a hierarchical variability-aware compact model methodology based on a comprehens...
Several emerging devices have been proposed to continue the CMOS scaling. To assess scalability, dev...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
One of the major limiting factors of the CMOS device, circuit and system simulation in sub 100nm reg...
It has been shown that sub 100nm SRAM is particularly sensitive to stochastic device variability. In...
Statistical variability in ultra-scaled CMOS devices is a major challenge faced by the semiconductor...
It has been shown that sub 100nm SRAM is particularly sensitive to stochastic device variability. In...
Statistical device variability may be a limiting factor for further miniaturizing nodes in silicon b...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
Statistical device variability may be a limiting factor for further miniaturizing nodes in silicon b...
In this paper a variability-aware compact modeling strategy is presented for 20-nm bulk planar techn...
This paper presents a hierarchical variability-aware compact model methodology based on a comprehens...
Several emerging devices have been proposed to continue the CMOS scaling. To assess scalability, dev...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
One of the major limiting factors of the CMOS device, circuit and system simulation in sub 100nm reg...
It has been shown that sub 100nm SRAM is particularly sensitive to stochastic device variability. In...
Statistical variability in ultra-scaled CMOS devices is a major challenge faced by the semiconductor...
It has been shown that sub 100nm SRAM is particularly sensitive to stochastic device variability. In...
Statistical device variability may be a limiting factor for further miniaturizing nodes in silicon b...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
A methodology for the investigation of CMOS variability using statistical measurements (spot, IV and...
Statistical device variability may be a limiting factor for further miniaturizing nodes in silicon b...
In this paper a variability-aware compact modeling strategy is presented for 20-nm bulk planar techn...