Scanning Probe Microscopy in Technology of Solar Cells Production

This article deals with implementation of Scanning Probe Microscopy (SPM) techniques to the characterization of crystalline silicon solar cells. Atomic Force Microscopy (AFM) is used for the characterization of solar cells texture, because it allows three dimensional imaging of surface structure [1]. Aim of this part of work was to set up a new methodology for surface evaluation in terms of optimization of the texturing process in solar cells mass-production. Monocrystalline silicon (mono-Si) wafers were etched in strong and weak alkaline solutions, and in strong acid solution which corresponds to standard methods of solar cells production. A detailed description of the surface was based on inspection of roughness parameters which were determined by the analysis of surface images. The second part of this work deals with possibility of Kelvin Probe Force Microscopy (KPFM) application for detection of Back Surface Field (BSF) presence and measurement its depth. KPFM enables to image surface electronic properties – specifically the Contact Potential Difference (UCPD) [2]. This method was used for checking the aluminum BSF (Al-BSF) layer presence and for measuring its depth