Hydrogenated amorphous silicon carbide (a-SiC:H) can provide exceptional surface passivation essential for high-efficiency crystalline silicon solar cells. This thesis reports on the fundamental study of a-SiC:H films deposited using a novel deposition technique, DC saddle field PECVD, in contrast to the conventional industrial use of RF-PECVD. The growth conditions were optimized and correlated with passivating, structural, and optical characteristics. The lifetime has a strong dependency on deposition temperature and improves by over two orders of magnitude as the temperature increases; the maximum lifetime achieved in this work reached 0.5 ms. In addition, the Tauc optical gap can be increased from 1.7 eV to 2.3 eV by varying the precurs...
Excellent passivation properties of intrinsic amorphous silicon carbide (a-SiCx:H) films deposited b...
Amorphous hydrogenated silicon-rich silicon carbide (a-Si0.8C0.2:H) thin films were prepared by plas...
Abstract only availablePlasma enhanced chemical vapor deposition (PECVD) (Applied Materials P5000, C...
Hydrogenated amorphous silicon carbide (a-SiC:H) can provide exceptional surface passivation essenti...
AbstractAmorphous hydrogenated silicon carbide (a-SiCx:H) could be used as a passivating layer in so...
Abstract Silicon carbide is a versatile material amenable to variety of applications from electrica...
Abstract Silicon carbide is a versatile material amenable to variety of applications from electrica...
Notre étude concerne la mise en place et le développement de dépôts de carbure de silicium amorphe h...
Hydrogenated amorphous silicon carbide (a-SiCx : H) films have shown excellent surface passivation o...
Hydrogenated amorphous silicon carbide (a-SiCx : H) films have shown excellent surface passivation o...
AbstractAmorphous hydrogenated silicon carbide (a-SiCx:H) could be used as a passivating layer in so...
We investigated amorphous silicon carbide (a-SiC:H) thin films deposited by plasma-enhanced chemical...
This paper reports on the preparation and characterization of hydrogenated amorphous silicon carbide...
Hydrogenated amorphous silicon carbide (a‐SiC:H) films were deposited with a radio‐frequency plasma‐...
Excellent passivation properties of intrinsic amorphous silicon carbide (a-SiCx:H) films deposited b...
Excellent passivation properties of intrinsic amorphous silicon carbide (a-SiCx:H) films deposited b...
Amorphous hydrogenated silicon-rich silicon carbide (a-Si0.8C0.2:H) thin films were prepared by plas...
Abstract only availablePlasma enhanced chemical vapor deposition (PECVD) (Applied Materials P5000, C...
Hydrogenated amorphous silicon carbide (a-SiC:H) can provide exceptional surface passivation essenti...
AbstractAmorphous hydrogenated silicon carbide (a-SiCx:H) could be used as a passivating layer in so...
Abstract Silicon carbide is a versatile material amenable to variety of applications from electrica...
Abstract Silicon carbide is a versatile material amenable to variety of applications from electrica...
Notre étude concerne la mise en place et le développement de dépôts de carbure de silicium amorphe h...
Hydrogenated amorphous silicon carbide (a-SiCx : H) films have shown excellent surface passivation o...
Hydrogenated amorphous silicon carbide (a-SiCx : H) films have shown excellent surface passivation o...
AbstractAmorphous hydrogenated silicon carbide (a-SiCx:H) could be used as a passivating layer in so...
We investigated amorphous silicon carbide (a-SiC:H) thin films deposited by plasma-enhanced chemical...
This paper reports on the preparation and characterization of hydrogenated amorphous silicon carbide...
Hydrogenated amorphous silicon carbide (a‐SiC:H) films were deposited with a radio‐frequency plasma‐...
Excellent passivation properties of intrinsic amorphous silicon carbide (a-SiCx:H) films deposited b...
Excellent passivation properties of intrinsic amorphous silicon carbide (a-SiCx:H) films deposited b...
Amorphous hydrogenated silicon-rich silicon carbide (a-Si0.8C0.2:H) thin films were prepared by plas...
Abstract only availablePlasma enhanced chemical vapor deposition (PECVD) (Applied Materials P5000, C...