The driving force behind combining the nanoimprinting and photolithography is to effectively utilize the advantages of both patterning techniques simultaneously. Conventional shadow-mask UV-lithography can be used to pattern micron-scale structures uniformly over large areas, whereas nanoimprinting enables patterning of nanoscale features, which can also be tilted or round-shaped. We present the work on direct patterning of micro-optical structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion. Hybrid mask mold fabrication can be realized for example by modifying conventional shadow-mask u...
This work presents a novel approach for combined micro- and nanofabrication based on the local laser...
Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolut...
This contribution sheds light on typical challenges in UV-based nanoimprint lithography (UV-NIL) fro...
The driving force behind combining the nanoimprinting and photolithography is to effectively utilize...
Nanoimprint lithography assisted by UV solidification is a new technique to pattern nanostructures b...
Interference lithography (IL) is the best suited technology for the origination of large area master...
Nano Imprint Lithography offers a route to high resolution patterning beyond the resolution limits i...
This chapter focuses on direct-nanoimprinting as an innovative structuring technique for micro- and ...
It is foreseen that nanoimprint lithography, NIL in short, will in the course of time have a strong ...
It is foreseen that nanoimprint lithography, NIL in short, will in the course of time have a strong ...
Although a large number of works on nanoimprint lithography (NIL) techniques have been reported, the...
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferr...
Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties t...
We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capabl...
We present a new method that allows to fabricate structures with tightly controlled three-dimensiona...
This work presents a novel approach for combined micro- and nanofabrication based on the local laser...
Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolut...
This contribution sheds light on typical challenges in UV-based nanoimprint lithography (UV-NIL) fro...
The driving force behind combining the nanoimprinting and photolithography is to effectively utilize...
Nanoimprint lithography assisted by UV solidification is a new technique to pattern nanostructures b...
Interference lithography (IL) is the best suited technology for the origination of large area master...
Nano Imprint Lithography offers a route to high resolution patterning beyond the resolution limits i...
This chapter focuses on direct-nanoimprinting as an innovative structuring technique for micro- and ...
It is foreseen that nanoimprint lithography, NIL in short, will in the course of time have a strong ...
It is foreseen that nanoimprint lithography, NIL in short, will in the course of time have a strong ...
Although a large number of works on nanoimprint lithography (NIL) techniques have been reported, the...
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferr...
Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties t...
We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capabl...
We present a new method that allows to fabricate structures with tightly controlled three-dimensiona...
This work presents a novel approach for combined micro- and nanofabrication based on the local laser...
Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolut...
This contribution sheds light on typical challenges in UV-based nanoimprint lithography (UV-NIL) fro...