A new fabrication process to create InGaAs/InP quantum wires on (100) GaAs substrates is demonstrated. The process is based on the selectivity of the growth of InP on lines created by focused ion beam bombardment, together with the selectivity of the growth of InGaAs on the InP wires. Intense photoluminescene is observed from the wires and the emission shows clear polarization parallel and perpendicular to the wires. Cathodoluminescene images confirm that the luminescence originates from the wires
Semiconductor optoelectronic devices are expected to have their performance improved by the use of q...
Asymmetric double GaAs/AlGaAs V-grooved quantum wires, grown by low pressure metalorganic chemical v...
We report the formation of GaAs quantum wires (QWRs) on (311)A substrates by droplet epitaxy. High-d...
A new fabrication process to create InGaAs/InP quantum wires on (100) GaAs substrates is demonstrate...
Maskless growth of InP wires on planar (100)GaAs substrates by hydride vapor phase epitaxy is demons...
A novel method for selective, maskless deposition of InP on GaAs has been developed. This method co...
Selective area growth on silicon dioxide masked gallium arsenide substrates by chemical beam epitaxy...
The formation of an InGaAs quantum well on nanoscale InP islands by selective growth using metalorga...
Chemical beam epitaxy was used to grow GaAs and InP based heterostructures on selectively masked sub...
Different types of InGaAs/GaAs deep-etched quantum wire (QWI) structure were successfully fabricated...
We report the growth of vertically stacked InGaAs/InP quantum wires on (001) Si substrates with adju...
The selective growth of nanometer scale GaAs wire and dot structures using metalorganic vapor phase ...
138 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.In light of the substantial p...
In this thesis growth on patterned substrates has been studied for the lateral bandgap control of th...
InGaAs quantum dots (QDs) and nanowires have been grown on GaAs by metal-organic chemical vapour dep...
Semiconductor optoelectronic devices are expected to have their performance improved by the use of q...
Asymmetric double GaAs/AlGaAs V-grooved quantum wires, grown by low pressure metalorganic chemical v...
We report the formation of GaAs quantum wires (QWRs) on (311)A substrates by droplet epitaxy. High-d...
A new fabrication process to create InGaAs/InP quantum wires on (100) GaAs substrates is demonstrate...
Maskless growth of InP wires on planar (100)GaAs substrates by hydride vapor phase epitaxy is demons...
A novel method for selective, maskless deposition of InP on GaAs has been developed. This method co...
Selective area growth on silicon dioxide masked gallium arsenide substrates by chemical beam epitaxy...
The formation of an InGaAs quantum well on nanoscale InP islands by selective growth using metalorga...
Chemical beam epitaxy was used to grow GaAs and InP based heterostructures on selectively masked sub...
Different types of InGaAs/GaAs deep-etched quantum wire (QWI) structure were successfully fabricated...
We report the growth of vertically stacked InGaAs/InP quantum wires on (001) Si substrates with adju...
The selective growth of nanometer scale GaAs wire and dot structures using metalorganic vapor phase ...
138 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.In light of the substantial p...
In this thesis growth on patterned substrates has been studied for the lateral bandgap control of th...
InGaAs quantum dots (QDs) and nanowires have been grown on GaAs by metal-organic chemical vapour dep...
Semiconductor optoelectronic devices are expected to have their performance improved by the use of q...
Asymmetric double GaAs/AlGaAs V-grooved quantum wires, grown by low pressure metalorganic chemical v...
We report the formation of GaAs quantum wires (QWRs) on (311)A substrates by droplet epitaxy. High-d...