Atomic and molecular layer deposition techniques have been successfully combined to produce inorganic-organic hybrid films with properties derived from both the inorganic and organic components. There are few reports dealing with further converting of ALD/MLD thin films. Typically inorganic oxide layers on polymer films in most cases require an additional top layer to enable heat sealing and to protect the thin film from mechanical stresses and defects. Adhesion of low-density polyethylene, polyethylene terephthalate and polylactic acid on ALD Al2O3 have been tested previously, where good adhesion was achieved in most cases only with the low-density polyethylene. In this study we report deposition of a hybrid ALD/MLD layer, its properties, ...
Organic\u2013inorganic hybrid coatings based on poly(e-caprolactone), poly(ethylene oxide) or poly(l...
Growing environmental concerns related to the use of synthetic non-biodegradable polymers in the pac...
Atomic layer deposition (ALD) is a surface controlled layer-by-layer process based on self-limiting ...
Possibility to control the adhesion properties is important in various industrial applications. Sinc...
Atomic and molecular layer deposition (ALD and MLD, respectively) are based on repeated cycles of ga...
Possibility to control the adhesion properties is important in various industrial applications. Sinc...
Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated c...
The fabrication of many devices in modern technol-ogy requires techniques for growing thin films. As...
We report a hybrid atomic layer deposition (ALD) / molecular layer deposition (MLD) approach that p...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATThe possibility to deposit purely organic and hybrid in...
Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of ...
The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical ...
Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature ...
Organic–inorganic hybrid coatings based on poly(e-caprolactone), poly(ethylene oxide) or poly(lactic...
Organic and organic/inorganic hybrid thin film materials have various potential applications because...
Organic\u2013inorganic hybrid coatings based on poly(e-caprolactone), poly(ethylene oxide) or poly(l...
Growing environmental concerns related to the use of synthetic non-biodegradable polymers in the pac...
Atomic layer deposition (ALD) is a surface controlled layer-by-layer process based on self-limiting ...
Possibility to control the adhesion properties is important in various industrial applications. Sinc...
Atomic and molecular layer deposition (ALD and MLD, respectively) are based on repeated cycles of ga...
Possibility to control the adhesion properties is important in various industrial applications. Sinc...
Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated c...
The fabrication of many devices in modern technol-ogy requires techniques for growing thin films. As...
We report a hybrid atomic layer deposition (ALD) / molecular layer deposition (MLD) approach that p...
| openaire: EC/FP7/339478/EU//LAYERENG-HYBMATThe possibility to deposit purely organic and hybrid in...
Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of ...
The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical ...
Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature ...
Organic–inorganic hybrid coatings based on poly(e-caprolactone), poly(ethylene oxide) or poly(lactic...
Organic and organic/inorganic hybrid thin film materials have various potential applications because...
Organic\u2013inorganic hybrid coatings based on poly(e-caprolactone), poly(ethylene oxide) or poly(l...
Growing environmental concerns related to the use of synthetic non-biodegradable polymers in the pac...
Atomic layer deposition (ALD) is a surface controlled layer-by-layer process based on self-limiting ...