Titanium nitride (TiN) films in the thickness range of 0.013 mu m to 0.3 pm were grown by high power impulse magnetron sputtering (HIPIMS) on silicon substrates in two deposition modes: a) the substrate was grounded and b) - 125 V bias was applied to the substrate. On the films we performed microstructure-, film texture- and film stress-analysis. The films deposited under - 125 V bias experienced a more energetic ion bombardment than the films deposited on grounded substrates. This difference in ion bombardment energy is reflected in the different microstructure. In contrast to previous results for TiN films grown by conventional reactive magnetron sputtering, we observe no major film stress gradient for increasing film thicknesses. We expl...
Titanium nitride (TiNx) thin films were grown by DC (Direct Current) magnetron sputtering method ont...
TiN films were deposited using high power impulse magnetron sputtering (HIPIMS) enabled four cathode...
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has r...
Abstract: Titanium nitride thin films deposited by reactive dc magnetron sputtering under various su...
CNPQ - CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICOIon bombardment during film grow...
The effect of substrate orientation and ion bombardment during the growth on the structure and prope...
HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for the depositio...
The real-time stress evolution during reactive dc magnetron sputter deposition of TiN films in Ar+N-...
In the present study, we investigate the impact of pulse power (Ppulse) on the ion flux and the prop...
We demonstrate the deposition of fully dense, stoichiometric TiN films on amorphous SiO2 by reactive...
The effect of applying a positive voltage pulse (Urev = 10–150 V) directly after the negative high p...
We report on intrinsic stress properties of magnetron sputtered titanium nitride films deposited und...
Polycrystalline and microcrystalline materials grown as thin films often exhibit a preferred crystal...
Morphology, structure, residual stress, and surface energy of magnetron-sputtered titanium nitride (...
Energetic-ion bombardment has become an attractive route to modify the crystal growth and deposit hi...
Titanium nitride (TiNx) thin films were grown by DC (Direct Current) magnetron sputtering method ont...
TiN films were deposited using high power impulse magnetron sputtering (HIPIMS) enabled four cathode...
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has r...
Abstract: Titanium nitride thin films deposited by reactive dc magnetron sputtering under various su...
CNPQ - CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICOIon bombardment during film grow...
The effect of substrate orientation and ion bombardment during the growth on the structure and prope...
HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for the depositio...
The real-time stress evolution during reactive dc magnetron sputter deposition of TiN films in Ar+N-...
In the present study, we investigate the impact of pulse power (Ppulse) on the ion flux and the prop...
We demonstrate the deposition of fully dense, stoichiometric TiN films on amorphous SiO2 by reactive...
The effect of applying a positive voltage pulse (Urev = 10–150 V) directly after the negative high p...
We report on intrinsic stress properties of magnetron sputtered titanium nitride films deposited und...
Polycrystalline and microcrystalline materials grown as thin films often exhibit a preferred crystal...
Morphology, structure, residual stress, and surface energy of magnetron-sputtered titanium nitride (...
Energetic-ion bombardment has become an attractive route to modify the crystal growth and deposit hi...
Titanium nitride (TiNx) thin films were grown by DC (Direct Current) magnetron sputtering method ont...
TiN films were deposited using high power impulse magnetron sputtering (HIPIMS) enabled four cathode...
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has r...