Fabrication of Metal and Organic Nanostructures on Silicon(100) With Scanning Tunneling Microscope-Based Lithography

81 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.The scanning tunneling microscope (STM) has been employed for both atomic-scale characterization and modification of surfaces. The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized "templates" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described.U of I OnlyRestricted to the U of I community idenfinitely during batch ingest of legacy ETD