Add to ORKG184 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1972.U of I OnlyRestricted to the U of I community idenfinitely during batch ingest of legacy ETD
Metal-oxide-semiconductor (MOS) structures with very thin (2 - 4 nm) oxide layers thermally grown on...
The influence of residual ions and gases at the Si/SiO2 interface in metal-oxide-semiconductor (MOS)...
Si-Si02 interface-state density was extensively examined f or metal-oxide-silicon structures subject...
184 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1972.U of I OnlyRestricted to the ...
157 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1979.U of I OnlyRestricted to the ...
143 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1971.U of I OnlyRestricted to the ...
149 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1970.U of I OnlyRestricted to the ...
94 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1967.U of I OnlyRestricted to the U...
115 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1968.U of I OnlyRestricted to the ...
Silicon is a lead component in modern technologies due to its relatively low cost, and stability und...
133 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1971.U of I OnlyRestricted to the ...
This paper reports on the study of inverted metal-oxide semiconductor (MOS) structures formed throug...
published_or_final_versionElectrical and Electronic EngineeringDoctoralDoctor of Philosoph
Six advanced oxidation techniques were analyzed, evaluated and compared with respect to the prepa ra...
[[abstract]]High quality thin oxide is indispensable for the Ultra Large Scale Integration (ULSI) ci...
Metal-oxide-semiconductor (MOS) structures with very thin (2 - 4 nm) oxide layers thermally grown on...
The influence of residual ions and gases at the Si/SiO2 interface in metal-oxide-semiconductor (MOS)...
Si-Si02 interface-state density was extensively examined f or metal-oxide-silicon structures subject...
184 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1972.U of I OnlyRestricted to the ...
157 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1979.U of I OnlyRestricted to the ...
143 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1971.U of I OnlyRestricted to the ...
149 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1970.U of I OnlyRestricted to the ...
94 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1967.U of I OnlyRestricted to the U...
115 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1968.U of I OnlyRestricted to the ...
Silicon is a lead component in modern technologies due to its relatively low cost, and stability und...
133 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1971.U of I OnlyRestricted to the ...
This paper reports on the study of inverted metal-oxide semiconductor (MOS) structures formed throug...
published_or_final_versionElectrical and Electronic EngineeringDoctoralDoctor of Philosoph
Six advanced oxidation techniques were analyzed, evaluated and compared with respect to the prepa ra...
[[abstract]]High quality thin oxide is indispensable for the Ultra Large Scale Integration (ULSI) ci...
Metal-oxide-semiconductor (MOS) structures with very thin (2 - 4 nm) oxide layers thermally grown on...
The influence of residual ions and gases at the Si/SiO2 interface in metal-oxide-semiconductor (MOS)...
Si-Si02 interface-state density was extensively examined f or metal-oxide-silicon structures subject...