The films which were prepared at room temperature by reactive rf sputtering of the target of gallium mental in an atmosphere of N2+Ar were found to show large variation in the absorption in the visible region of the spectrum. The optical gap energies of the films vary from 0.9eVto more than 4.0eV corresponding to the preparation condition of nitrogen pressure. Transmission electron diffraction study showed that the films were amorphous alloys composed og gallium, nitrogen and oxygen. Room temperature conductivities change from 10^-6 to 10^-10 ohm^-1 cm^-1. The temperature dependence of conductivities give activation energies of 0.5-0.8eV. Yellow photoluminescence was observed in films having wide optical gap energies. At present, these vari...
The potential of effectively n type doping Ga2O3 considering its large band gap has made it an attra...
We investigate the effect of thermal annealing in argon and of oxygen plasma processing on the photo...
MasterThe optical, electrical and chemical properties of amorphous indium gallium zinc oxide (a-IGZO...
The films which were prepared at room temperature by reactive rf sputtering of the target of gallium...
[[abstract]]Oxygen is a common impurity in nitride-based materials that affects the properties of te...
Oxygen is a common impurity in nitride-based materials that affects the properties of technologicall...
Aluminum-gallium oxide (AGO) films on c-plane sapphire substrates by pulsed laser deposition are des...
We have observed an “above band-gap” Urbach like characteristic for gallium nitride films (at the hi...
International audienceArticles you may be interested in Investigation on the compensation effect of ...
The optoelectronic parameters of tris (8-hydroxyquinoline) gallium (Gaq3) films were tuned by means ...
A remarkable improvement in the conductivity of grown nitrogen-doped p-type β-Ga2O3 films was succes...
The bandgap and optical absorption edge are measured in semi-insulating and p-type GaNAs as a funct...
Abstract. It has been predicted that amorphous gallium nitride (a-GaN) has a low density of states w...
Nanocrystalline gallium nitride (GaN) thin films were deposited on quartz substrates by reactive rf ...
Structural order in nanocrystalline, oxygenated GaN thin films (thickness ~ 500 nm) has been examine...
The potential of effectively n type doping Ga2O3 considering its large band gap has made it an attra...
We investigate the effect of thermal annealing in argon and of oxygen plasma processing on the photo...
MasterThe optical, electrical and chemical properties of amorphous indium gallium zinc oxide (a-IGZO...
The films which were prepared at room temperature by reactive rf sputtering of the target of gallium...
[[abstract]]Oxygen is a common impurity in nitride-based materials that affects the properties of te...
Oxygen is a common impurity in nitride-based materials that affects the properties of technologicall...
Aluminum-gallium oxide (AGO) films on c-plane sapphire substrates by pulsed laser deposition are des...
We have observed an “above band-gap” Urbach like characteristic for gallium nitride films (at the hi...
International audienceArticles you may be interested in Investigation on the compensation effect of ...
The optoelectronic parameters of tris (8-hydroxyquinoline) gallium (Gaq3) films were tuned by means ...
A remarkable improvement in the conductivity of grown nitrogen-doped p-type β-Ga2O3 films was succes...
The bandgap and optical absorption edge are measured in semi-insulating and p-type GaNAs as a funct...
Abstract. It has been predicted that amorphous gallium nitride (a-GaN) has a low density of states w...
Nanocrystalline gallium nitride (GaN) thin films were deposited on quartz substrates by reactive rf ...
Structural order in nanocrystalline, oxygenated GaN thin films (thickness ~ 500 nm) has been examine...
The potential of effectively n type doping Ga2O3 considering its large band gap has made it an attra...
We investigate the effect of thermal annealing in argon and of oxygen plasma processing on the photo...
MasterThe optical, electrical and chemical properties of amorphous indium gallium zinc oxide (a-IGZO...