Thin films of BaTiO3 were deposited on platinum coated silicon substrates by excimer laser (248 nm) ablation at 600° C or ex situ crystallized at about the same annealing temperature. Films deposited at 600° C showed good crystallinity and were characterized for ferroelectricity, dielectric constant, dielectric loss, leakage current, and C-V characteristics. The films showed a dielectric constant of 220, a dissipation factor of 0.02, a leakage current of 1.8× 10-6 A/cm2 at a bias of 5 V, and a charge storage density of about 40 fC/µ m2 at a field of 0.15 MV/cm
Pulsed UV excimer laser ablation was employed to deposit multi-axial, bi-axial and uni-axial ferroel...
Thin films of Ba(Zr0.1Ti0.9)O3 were deposited by pulsed excimer laser ablation technique on Pt subst...
Polycrystalline thin films of Ba(Sn0.1Ti0.9)O3 were deposited on Pt coated silicon substrates by pul...
Polycrystalline thin films of Ba0.5Sr0.5TiO3 were deposited by excimer laser (248 nm) ablation. Film...
Recently, there has been growing interest in Ca modified BaTiO3 structures due to their larger elect...
Recently, there has been growing interest in Ca modified $BaTiO_3$ structures due to their larger el...
Ba1–xCaxTiO3 thin films (x = 0.05 to 0.17) were deposited on Pt-coated Si substrates using a pulsed ...
Bismuth titanate thin films were deposited by the excimer laser ablation technique. Process paramete...
Ba1-xCaxTiO3 thin films (x=0.05 to 0.17) were deposited on Pt-coated Si substrates using a pulsed ex...
KrF excimer laser radiation (lambda=248 nm, tau=25 ns) is used for pulsed laser deposition of BaTiO3...
Ba1 - xCaxTiO3 targets were prepared by conventional solid state reaction with varied amounts of the...
We have studied the deposition of BaTiO3 (BTO) thin films on various substrates. Three representativ...
Polycrystalline (Pb,La)TiO3 thin films were deposited by pulsed excimer laser ablation on Si and Pt ...
Thin films of Ba(Zr0.1Ti0.9)O-3 were deposited by pulsed excimer laser ablation technique on Pt subs...
Thin films of Ba(Zr0.1Ti0.9)O-3 were deposited by pulsed excimer laser ablation technique on Pt subs...
Pulsed UV excimer laser ablation was employed to deposit multi-axial, bi-axial and uni-axial ferroel...
Thin films of Ba(Zr0.1Ti0.9)O3 were deposited by pulsed excimer laser ablation technique on Pt subst...
Polycrystalline thin films of Ba(Sn0.1Ti0.9)O3 were deposited on Pt coated silicon substrates by pul...
Polycrystalline thin films of Ba0.5Sr0.5TiO3 were deposited by excimer laser (248 nm) ablation. Film...
Recently, there has been growing interest in Ca modified BaTiO3 structures due to their larger elect...
Recently, there has been growing interest in Ca modified $BaTiO_3$ structures due to their larger el...
Ba1–xCaxTiO3 thin films (x = 0.05 to 0.17) were deposited on Pt-coated Si substrates using a pulsed ...
Bismuth titanate thin films were deposited by the excimer laser ablation technique. Process paramete...
Ba1-xCaxTiO3 thin films (x=0.05 to 0.17) were deposited on Pt-coated Si substrates using a pulsed ex...
KrF excimer laser radiation (lambda=248 nm, tau=25 ns) is used for pulsed laser deposition of BaTiO3...
Ba1 - xCaxTiO3 targets were prepared by conventional solid state reaction with varied amounts of the...
We have studied the deposition of BaTiO3 (BTO) thin films on various substrates. Three representativ...
Polycrystalline (Pb,La)TiO3 thin films were deposited by pulsed excimer laser ablation on Si and Pt ...
Thin films of Ba(Zr0.1Ti0.9)O-3 were deposited by pulsed excimer laser ablation technique on Pt subs...
Thin films of Ba(Zr0.1Ti0.9)O-3 were deposited by pulsed excimer laser ablation technique on Pt subs...
Pulsed UV excimer laser ablation was employed to deposit multi-axial, bi-axial and uni-axial ferroel...
Thin films of Ba(Zr0.1Ti0.9)O3 were deposited by pulsed excimer laser ablation technique on Pt subst...
Polycrystalline thin films of Ba(Sn0.1Ti0.9)O3 were deposited on Pt coated silicon substrates by pul...