Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress in phase evolution in these films upon annealing and laser mixing has been studied. Characterization of the as deposited and the treated states were carried out with X-ray diffraction (XRD), transmission electron microscopy (TEM) and differential scanning calorimetry (DSC) techniques. As-deposited state reveals the presence of elemental Ni and Al with grain size comparable to the film thickness. Phase evolution upon annealing occurs in several stages determined by the kinetics of nucleation and growth. Al<SUB>3</SUB>Ni and Al<SUB>3</SUB>Ni<SUB>2</SUB> initially form at 673 K and transforms to a mixture of AlNi and Ni<SUB>3</SUB>Al at about 87...
AbstractThe attractive properties of Al-Ni intermetallic phases and their extensive field of technol...
The phase evolution during low-temperature heat treatment of Al and Ni nanoparticles synthesized wit...
The as-deposited Ni-Al films, fabricated at 673 K by pulsed laser deposition (PLD), were annealed at...
Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress ...
Two phase granular thin films are of great current interest. These have wide applications in the dev...
Intermetallic thin films find application as protective high-temperature oxidation resistant coating...
In order to obtain basic understanding of microstructure evolution in laser-surface-alloyed layers, ...
Thin films of Al-50 at.% Ni composition were deposited by laser ablation technique on single crystal...
Multilayers of Ni and Al of 10 nm periodicity have been sequentially deposited by RF sputtering. Onl...
Reactive multilayer systems represent an innovative approach for potential usage in chip joining app...
The Ni/Al multilayer coating of λ ≈100 nm was deposited onto (001)-oriented monocrystalline silicon ...
A multilayer coating of Ni/Cu/Al was fabricated on magnesium substrates using laser cladding. The so...
There is a growing interest in laser melting processes, e.g., for metal additive manufacturing. Mode...
Ion beam mixing is used to homogenize multilayered thin films of nickel and aluminum, vapor deposite...
n this work the effects of prolonged heat treatments on the microstructural and crystallographic evo...
AbstractThe attractive properties of Al-Ni intermetallic phases and their extensive field of technol...
The phase evolution during low-temperature heat treatment of Al and Ni nanoparticles synthesized wit...
The as-deposited Ni-Al films, fabricated at 673 K by pulsed laser deposition (PLD), were annealed at...
Multilayers of Ni and Al of 1:1 ratio, 50 nm periodicity, were deposited using sputtering. Progress ...
Two phase granular thin films are of great current interest. These have wide applications in the dev...
Intermetallic thin films find application as protective high-temperature oxidation resistant coating...
In order to obtain basic understanding of microstructure evolution in laser-surface-alloyed layers, ...
Thin films of Al-50 at.% Ni composition were deposited by laser ablation technique on single crystal...
Multilayers of Ni and Al of 10 nm periodicity have been sequentially deposited by RF sputtering. Onl...
Reactive multilayer systems represent an innovative approach for potential usage in chip joining app...
The Ni/Al multilayer coating of λ ≈100 nm was deposited onto (001)-oriented monocrystalline silicon ...
A multilayer coating of Ni/Cu/Al was fabricated on magnesium substrates using laser cladding. The so...
There is a growing interest in laser melting processes, e.g., for metal additive manufacturing. Mode...
Ion beam mixing is used to homogenize multilayered thin films of nickel and aluminum, vapor deposite...
n this work the effects of prolonged heat treatments on the microstructural and crystallographic evo...
AbstractThe attractive properties of Al-Ni intermetallic phases and their extensive field of technol...
The phase evolution during low-temperature heat treatment of Al and Ni nanoparticles synthesized wit...
The as-deposited Ni-Al films, fabricated at 673 K by pulsed laser deposition (PLD), were annealed at...