An electrically active defect has been observed at a level position of ∼ 0.70 eV below the conduction band edge (Ec) with an extrapolated capture cross section of ∼ 5×10−14 cm2 in epitaxial layers .
Electrical properties of deep levels introduced during quenching from high temperatures in VPE layer...
Radiation damage produced in 4H–SiC n–epilayers by electrons of different energies is presented. Jun...
This paper studies the electrically active deep level defects introduced in epitaxial n-type 4H-SiC ...
An electrically active defect has been observed at a level position of ∼ 0.70 eV below the conductio...
Hydrogen is known to passivate donor and acceptor levels in SiC bulk, and also at the surface by for...
In this paper, we report on defects introduced in epitaxially grown n-type silicon (Si) during elect...
10.1016/S1369-8001(02)00025-2Materials Science in Semiconductor Processing46595-60
none2The electrical properties of high-purity 4H–SiC epitaxial layers are investigated. The current ...
Using a combination of photoluminescence and electrical characterization, defects in the epitaxial l...
The defects in InP epitaxial structures (containing in part Pt nanoparticles) and SiGe/Si heterostr...
Electrically active defects in epitaxial, n-type, 4H-SiC have been investigated by electron-beam-ind...
We present a study of deep level defects created in isolated ion cascades produced in nitrogen-low-d...
© 2018 Author(s). In0.53Ga0.47As p + n diodes with different densities of extended defects have been...
11th International Workshop on Radiation Imaging Detectors, Czech Technical Univ, Inst Experimental ...
The present work reviews atomic-scale properties of point defects and dopant atoms exposed in and be...
Electrical properties of deep levels introduced during quenching from high temperatures in VPE layer...
Radiation damage produced in 4H–SiC n–epilayers by electrons of different energies is presented. Jun...
This paper studies the electrically active deep level defects introduced in epitaxial n-type 4H-SiC ...
An electrically active defect has been observed at a level position of ∼ 0.70 eV below the conductio...
Hydrogen is known to passivate donor and acceptor levels in SiC bulk, and also at the surface by for...
In this paper, we report on defects introduced in epitaxially grown n-type silicon (Si) during elect...
10.1016/S1369-8001(02)00025-2Materials Science in Semiconductor Processing46595-60
none2The electrical properties of high-purity 4H–SiC epitaxial layers are investigated. The current ...
Using a combination of photoluminescence and electrical characterization, defects in the epitaxial l...
The defects in InP epitaxial structures (containing in part Pt nanoparticles) and SiGe/Si heterostr...
Electrically active defects in epitaxial, n-type, 4H-SiC have been investigated by electron-beam-ind...
We present a study of deep level defects created in isolated ion cascades produced in nitrogen-low-d...
© 2018 Author(s). In0.53Ga0.47As p + n diodes with different densities of extended defects have been...
11th International Workshop on Radiation Imaging Detectors, Czech Technical Univ, Inst Experimental ...
The present work reviews atomic-scale properties of point defects and dopant atoms exposed in and be...
Electrical properties of deep levels introduced during quenching from high temperatures in VPE layer...
Radiation damage produced in 4H–SiC n–epilayers by electrons of different energies is presented. Jun...
This paper studies the electrically active deep level defects introduced in epitaxial n-type 4H-SiC ...