Simulation of influence of cathode surface sputtering process to the parameters of high voltage glow discharge torn sources / I. V. Melnyk

В статье рассматриваются вопросы моделирования взаимодействия ионного потока с поверхностью катода в устройствах на основе высоковольтного тлеющего разряда и распыления материала катода под действием ионной бомбардировки. Проведен теоретический анализ процесса распыления с учетом сорбции и десорбции. Анализируется пространственная неоднородность распыления катода в реальных электродных системах на основе высоковольтного тлеющего разряда и изменение положения фокуса формируемого электронного пучка.The problems of simulation of Interaction of flows of ions and accelerated neutral gas atoms in a condition of high voltage glow discharge as wall as disposition of cathode material under its action Is analysed in this article. Theoretical analyse of process of material disposition based on balance of sorption and desorption atoms in a case of nonelastic collisions have been provided. The space uninterrupting of cathode sputtering in real high voltage glow discharge electrodes systems is analysed and theoretically Investigated influence of changing of cathode geometry to distribution of current density in a focus of electron beam. Obtained model of cathode surface sputtering as well as changing of its geometry was used in software applications for simulation of changing of focal current density distribution of formed electron beam. For providing this calculations cathode geometry and geometry of plasma boundary which considered as moving electrode with known potential were approximated by using quasicube splines. The best accuracy of calculation results with respect to experimental data were obtained for range of acceleration voltage 110 kV and operation pressure 510 Pa