Thin antireflection coatings for solar cells / A.M. Nazarov, S.V.Koveshnikov, Sh.Z.Кurbanbaev, А.B.Zhabbarov, B.Kh.Ochilov

Секция 6. Современное оборудование и технологииРазработана технология изготовления просветляющих покрытий малой толщины для солнечных элементов с использованием «искусственных» диэлектриков. Достигнуто уменьшение поглощения в «искусственном» диэлектрике в три раза. Используется двухслойное покрытие с общей толщиной около λ/6, аналогичное СВЧ несинхронному трансформатору сопротивлений. Толщина сильно поглощающего слоя не более λ/12 = To create a technology for obtaining films with adjustable refractive index of the possibilities of vacuum methods for obtaining transparent films of wide bandgap semiconductor materials. Highlighted three possible areas: Application of diamond coatings on silicon structures using ion source with a cold cathode and working substances such as organic solvents. The coating type oxide and oxynitrides titanium, zirconium, tantalum with metal nanoclusters using magnetron sputtering in combination with ion sources for surface treatment and reactive deposition. The application of oxide antireflective coating of metals such as titanium or zirconium, in an environment of argon-oxygen. The developed technology for producing antireflective coatings of small thickness for solar cells with the use of «artificial dielectrics». Reduced absorption in «artificial dielectric» three times. Ellipsometric method of measuring refractive index and thickness of films on silicon and glass substrates. Selected modes of deposition of layers with refractive indices of 1.49 and 3.9. The obtained two-layer coating with a reflectance less than 2% at the wavelength of 0.6328 micron