Magnetotransport in Nanostructured Ni Films Electrodeposited on Si Substrate

The study of electrical resistivity  and magnetoresistance MR in nanogranular Ni films was performed over the temperature range 2 - 300 K and at the magnetic field induction B up to 8 T. The Ni layers having a thickness of about 500 nm were prepared by electrodeposition on n-Si wafers. According to an X-ray diffraction study, a strongly textured face-centered cubic structure was formed in the as-deposited films with an average grain sizes of about 10 - 70 nm. Experiments have demonstrated that the magnetic field and temperature dependences of the MR effect in Ni films shown two main peculiarities: (1) dependencies on the mutual orientations of vectors B, current and the film plane; (2) two contributions to the MR - negative anisotropic magnetoresistance and positive Lorentz-like MR