An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Extended X-ray Absorption Fine Structure (EXAFS) near the K-edge of titanium in nanocrystalline titanium nitride coatings containing additives of copper, silicon, and aluminum. Using the observation data, the structure parameters of the local environment of titanium atoms have been estimated for the coatings. According to crystallographic data, the Ti-N distance in the bulk phase of titanium nitride is 2.12 Å and the Ti-Ti distance is 3.0 Å. Nearly these values have been obtained for the respective parameters of the coatings. The presence of copper as an additive in a TiN coating increases the Ti-N distance inappreciably compared to that estimate...
International audienceTitanium and aluminium nitride Ti1 − xAlxN films deposited by radiofrequency m...
Nitrogen and aluminum concentration profiles in the near surface region of the Ti6Al4V-ELI alloy pla...
Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to inv...
An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Exte...
International audienceThin films of Ti1−xAlxN nitrides were prepared over a large range of compositi...
International audienceIndentation tests are performed on a set of Ti1 − xAlxN films prepared in vari...
Multilayered TiAlN/Mo coatings were deposited by dc reactive magnetron sputtering in a custom-made c...
The microstructure, the stresses, and the elemental composition of Ti-Al-Si-N gradient coatings are ...
XANES (X-ray Absorption Near Edge Structure) of TiN and TiO2 layers on various substrates have been ...
Titanium nitride films were produced on silicon substrate by ion beam assisted deposition in the alt...
Nitrides (such as BN and TiN) are widely used in various industrial applications because of their ex...
Une série de films Ti1-xAlxN (0 ≤ x ≤ 1, teneur en Al) de différentes épaisseurs (300 – 500 et ≃ 200...
Both aluminum and titanium K-edge XAFS spectra of Ti1-xAlxN (0≤x≤1.0) films were measured to investi...
With the concept of digital factory, a research including experiment, kinetic Monte Carlo simulation...
International audienceTitanium and aluminium nitride Ti1 − xAlxN films deposited by radiofrequency m...
Nitrogen and aluminum concentration profiles in the near surface region of the Ti6Al4V-ELI alloy pla...
Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to inv...
An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Exte...
International audienceThin films of Ti1−xAlxN nitrides were prepared over a large range of compositi...
International audienceIndentation tests are performed on a set of Ti1 − xAlxN films prepared in vari...
Multilayered TiAlN/Mo coatings were deposited by dc reactive magnetron sputtering in a custom-made c...
The microstructure, the stresses, and the elemental composition of Ti-Al-Si-N gradient coatings are ...
XANES (X-ray Absorption Near Edge Structure) of TiN and TiO2 layers on various substrates have been ...
Titanium nitride films were produced on silicon substrate by ion beam assisted deposition in the alt...
Nitrides (such as BN and TiN) are widely used in various industrial applications because of their ex...
Une série de films Ti1-xAlxN (0 ≤ x ≤ 1, teneur en Al) de différentes épaisseurs (300 – 500 et ≃ 200...
Both aluminum and titanium K-edge XAFS spectra of Ti1-xAlxN (0≤x≤1.0) films were measured to investi...
With the concept of digital factory, a research including experiment, kinetic Monte Carlo simulation...
International audienceTitanium and aluminium nitride Ti1 − xAlxN films deposited by radiofrequency m...
Nitrogen and aluminum concentration profiles in the near surface region of the Ti6Al4V-ELI alloy pla...
Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to inv...