Add to ORKG259-259A use of the four-probe resistance measurements as a tool for characterization of a quality of titanium nitride thin films deposited by the reactive dc magnetron sputtering will be discussed in the report. Few series of ~ 50 nm thick films on various substrates as fused silica, monocrystalline silicon and magnesium oxide have been deposited with several degrees of freedom (substrate temperature, magnetron chamber atmosphere and working pressure etc.) varied in a wide range. Electrical resistivity correlation with the films properties will be reported
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
In the field of magnetron sputtering, it is well established that mid-frequency (20–350 kHz) pulsed ...
Titanium nitride (TiNx) thin films were grown by DC (Direct Current) magnetron sputtering method ont...
A use of the four-probe resistance measurements as a tool for characterization of a quality of titan...
© Published under licence by IOP Publishing Ltd. Reactive dc magnetron sputtering was employed to pr...
Titanium nitride thin films have been grown on Si substrates by using DC reactive magnetron sputteri...
Titanium nitride (TiN) films were deposited on different substrates by reactive magnetron sputterin...
AbstractTitanium nitride (TiNx) was deposited by reactive sputtering using a titanium target in a ni...
Ti/TiN multilayers were deposited by DC reactive magnetron sputtering method using a titanium target...
Reactively sputtered titanium-nitride layers have been incorporated as diffusion barriers in a titan...
Thin nanocrystalline Titanium nitride (TiN) films were deposited on mild steel (MS) substrates usin...
Polished samples of low carbon steel (LCS) rod cross-sections were sputtered with different thicknes...
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
40th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), San Diego, CA, APR ...
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
In the field of magnetron sputtering, it is well established that mid-frequency (20–350 kHz) pulsed ...
Titanium nitride (TiNx) thin films were grown by DC (Direct Current) magnetron sputtering method ont...
A use of the four-probe resistance measurements as a tool for characterization of a quality of titan...
© Published under licence by IOP Publishing Ltd. Reactive dc magnetron sputtering was employed to pr...
Titanium nitride thin films have been grown on Si substrates by using DC reactive magnetron sputteri...
Titanium nitride (TiN) films were deposited on different substrates by reactive magnetron sputterin...
AbstractTitanium nitride (TiNx) was deposited by reactive sputtering using a titanium target in a ni...
Ti/TiN multilayers were deposited by DC reactive magnetron sputtering method using a titanium target...
Reactively sputtered titanium-nitride layers have been incorporated as diffusion barriers in a titan...
Thin nanocrystalline Titanium nitride (TiN) films were deposited on mild steel (MS) substrates usin...
Polished samples of low carbon steel (LCS) rod cross-sections were sputtered with different thicknes...
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
40th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), San Diego, CA, APR ...
Results of investigations of kinetic properties of TiN thin films prepared by dc reactive magnetron ...
In the field of magnetron sputtering, it is well established that mid-frequency (20–350 kHz) pulsed ...
Titanium nitride (TiNx) thin films were grown by DC (Direct Current) magnetron sputtering method ont...