International audienceAmong the common vacancy-related point defects in silicon, the E center is one of the most prominent due to its degrading effect in silicon-based technology. Even though it has been the subject of extensive experimental and theoretical studies, a comprehensive theoretical model capable of reproducing the experimental evidence for all three dopants (P, As and Sb) is still missing. Guided by a Jahn-Teller model, we are able to reproduce the absorption bands and the transition probability between equivalent geometries of the defect at low temperatures by including many-body-perturbation corrections based on the GW approximation on top of DFT. At higher temperatures, vacancies become mobile centers, allowing the reorientat...
In this paper, we develop and analyze models for the coupled iffusion of dopants and point defects, ...
Recent experimental studies of Shimizu [Phys. Rev. Lett. 98, 095901 (2007)] revealed an activation e...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
The suitability of silicon for micro and sub-micro electronic devices is being challenged by the agg...
Silicon technology is based on doping with atoms from the groups III and V of the periodic system, w...
The current understanding of dopant diffusion in silicon comes from the synthesis of experimental an...
This thesis covers the application of the local density approximation of density functional theory t...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
In this paper, we develop and analyze models for the coupled iffusion of dopants and point defects, ...
Recent experimental studies of Shimizu [Phys. Rev. Lett. 98, 095901 (2007)] revealed an activation e...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
International audienceAmong the common vacancy-related point defects in silicon, the E center is one...
The suitability of silicon for micro and sub-micro electronic devices is being challenged by the agg...
Silicon technology is based on doping with atoms from the groups III and V of the periodic system, w...
The current understanding of dopant diffusion in silicon comes from the synthesis of experimental an...
This thesis covers the application of the local density approximation of density functional theory t...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...
In this paper, we develop and analyze models for the coupled iffusion of dopants and point defects, ...
Recent experimental studies of Shimizu [Phys. Rev. Lett. 98, 095901 (2007)] revealed an activation e...
We study enhanced/retarded diffusion of oxygen in doped silicon by means of first principle calculat...