TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopLos recubrimientos TixAl1-xN se cultivaron usando la técnica de pulverización catódica con magnetrón triodo, variando el voltaje de polarización entre -40 V y -150V. La influencia del voltaje de polarización en las propiedades estructurales y morfológica
[[abstract]]Multi-element (AlCrTaTiZr)N coatings are prepared by reactive RF magnetron sputtering. T...
Las capas de nitruro de aluminio (AlN) y las multicapas de (AlN/Mn) fueron crecidas por pulverizac...
Cubic NaCl-B1 structured multilayer TiAlN/VN with a bi-layer thickness of approximately 3 nm and ato...
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias volta...
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias volta...
TixAl1-xN coatings were grown using the triode magnetron sputtering technique with various bias volt...
In this study, a negative substrate bias voltage is used to tune the structural, morphological, mech...
TiAlN films were deposited on AISI O1 tool steel using a triode magnetron sputtering system. The bia...
In this paper, it is aimed to investigate the structural and mechanical properties of TiAlN coatings...
International audience(Al, Ti)N coatings were reactively cosputtered using a hybrid process in Ar/ N...
TiN/TiAIN multilayer were deposited by means of d.c. reactive Magnetron Sputtering technique using t...
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has r...
In this work, the influence of the substrate bias on the crystalline structure and surface compositi...
L'objet de la thèse est l'étude de films monocouches et multicouclies du système (Ti-Al-N) utilisés ...
Multilayer TiAlN and AlN coatings were deposited from two targets onto high speed steel (HSS) and ha...
[[abstract]]Multi-element (AlCrTaTiZr)N coatings are prepared by reactive RF magnetron sputtering. T...
Las capas de nitruro de aluminio (AlN) y las multicapas de (AlN/Mn) fueron crecidas por pulverizac...
Cubic NaCl-B1 structured multilayer TiAlN/VN with a bi-layer thickness of approximately 3 nm and ato...
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias volta...
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias volta...
TixAl1-xN coatings were grown using the triode magnetron sputtering technique with various bias volt...
In this study, a negative substrate bias voltage is used to tune the structural, morphological, mech...
TiAlN films were deposited on AISI O1 tool steel using a triode magnetron sputtering system. The bia...
In this paper, it is aimed to investigate the structural and mechanical properties of TiAlN coatings...
International audience(Al, Ti)N coatings were reactively cosputtered using a hybrid process in Ar/ N...
TiN/TiAIN multilayer were deposited by means of d.c. reactive Magnetron Sputtering technique using t...
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has r...
In this work, the influence of the substrate bias on the crystalline structure and surface compositi...
L'objet de la thèse est l'étude de films monocouches et multicouclies du système (Ti-Al-N) utilisés ...
Multilayer TiAlN and AlN coatings were deposited from two targets onto high speed steel (HSS) and ha...
[[abstract]]Multi-element (AlCrTaTiZr)N coatings are prepared by reactive RF magnetron sputtering. T...
Las capas de nitruro de aluminio (AlN) y las multicapas de (AlN/Mn) fueron crecidas por pulverizac...
Cubic NaCl-B1 structured multilayer TiAlN/VN with a bi-layer thickness of approximately 3 nm and ato...