Dynamic random access memory (DRAM) data retention time degradation induced by radiation exposure is investigated in this paper. We present the experimental setup and the results of total ionizing dose (TID) test on a COTS SDRAM de- vice. We observed a significant retention time reduction related to the absorbed dose and we assume radiation induced interface trap generation as the origin of the retention time reduction. By measuring individual cells retention time before and after radiation exposures, we found out that the reduction is not homogeneous among cells: the amount of leakage current increase depends on the position and the energy level of the generated trap, leading to a wide distribution of retention time reduction. Of particula...
In this work we investigate the influence of various memory chips supply voltage on their sensitivit...
We investigate total ionizing dose effects on 4Mbit phase change memories (PCM) arrays. We demonstra...
In this paper, electrical characteristics of an HfO2-based resistive switching memory device are inv...
Dynamic random access memory (DRAM) data retention time degradation induced by radiation exposure is...
A single particle generates a Single Event Upset(SEU) as well as dose effects in silicon devices. Th...
International audienceThree synchronous dynamic random access memories (SDRAMs) from the same manufa...
Flash memories operating in space are subject at the same time to the progressive accumulation of to...
Single-event upset (SEU) hardness varies across dies, wafers, and lots—even just after fabrication a...
This paper investigates the Total Ionizing Dose (TID) effect on DDR4 SDRAM, using 60Co gamma-rays. A...
[[abstract]]The research is based on the nuclear radiation induced soft error phenomenon associated ...
Dynamic random access memory (DRAM) is the most widely used type of memory in the consumer market to...
As DRAM cells continue to shrink, they become more susceptible to retention failures. DRAM cells tha...
The total ionizing dose (TID) effects on single-event upset (SEU) hardness are investigated for two ...
Threshold voltage (Vth) and drain-source current (Ids) behaviour of nitride read only memories (NROM...
We study total dose effects in advanced multi- and single-level NAND Flash memories. We discuss rete...
In this work we investigate the influence of various memory chips supply voltage on their sensitivit...
We investigate total ionizing dose effects on 4Mbit phase change memories (PCM) arrays. We demonstra...
In this paper, electrical characteristics of an HfO2-based resistive switching memory device are inv...
Dynamic random access memory (DRAM) data retention time degradation induced by radiation exposure is...
A single particle generates a Single Event Upset(SEU) as well as dose effects in silicon devices. Th...
International audienceThree synchronous dynamic random access memories (SDRAMs) from the same manufa...
Flash memories operating in space are subject at the same time to the progressive accumulation of to...
Single-event upset (SEU) hardness varies across dies, wafers, and lots—even just after fabrication a...
This paper investigates the Total Ionizing Dose (TID) effect on DDR4 SDRAM, using 60Co gamma-rays. A...
[[abstract]]The research is based on the nuclear radiation induced soft error phenomenon associated ...
Dynamic random access memory (DRAM) is the most widely used type of memory in the consumer market to...
As DRAM cells continue to shrink, they become more susceptible to retention failures. DRAM cells tha...
The total ionizing dose (TID) effects on single-event upset (SEU) hardness are investigated for two ...
Threshold voltage (Vth) and drain-source current (Ids) behaviour of nitride read only memories (NROM...
We study total dose effects in advanced multi- and single-level NAND Flash memories. We discuss rete...
In this work we investigate the influence of various memory chips supply voltage on their sensitivit...
We investigate total ionizing dose effects on 4Mbit phase change memories (PCM) arrays. We demonstra...
In this paper, electrical characteristics of an HfO2-based resistive switching memory device are inv...