The nanocrystalline gradient coatings system Ti-Al-Si-Cu-N were annealed in the temperature range of 500– 1100°C. Their composition, structure, and mechanical properties were studied by methods of scanning and transmission electron microscopy, scratch test, and measurement of nanohardness. It is shown that the diffusion of substrate elements has a crucial impact on the heat-activated processes of structure recovery, the growth of crystal size and the properties of materials. This results in nanocomposite structure with high adhesion characteristics of the coatings
Scanning electron microscopy with energy dispersive element microanalysis, X-ray structural analys...
The microstructure, the stresses, and the elemental composition of Ti-Al-Si-N gradient coatings are ...
A gradient magnetron-sputtered three-layer laminated Ti–Ni–Ti coating is formed by the method of rea...
The nanocrystalline gradient coatings system Ti-Al-Si-Cu-N were annealed in the temperature range of...
Using the method of microprobe analysis and transmission electron microscopy, the influence of obtai...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
A study of the structural and mechanical properties of nanocrystalline TiAlSiN gradient coatings dep...
The effect of the elemental composition of AlxSi1−xN coatings deposited on Cu substrates by magnetro...
Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, us...
Using such unique methods of analysis as slow positron beam (SPB), RBS, μ-PIXE (proton microbeam), X...
Current paper presents the results of investigating of nanostructured cathode arc vacuum evaporation...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Surface nanocrystallization (SNC) not only can provide an alternative approach to improving the surf...
Nanostructured thin-film coatings based on titanium nitride, doped with silicon, chromium and alumin...
The paper describes the nanostructured coatings produced by C-PVD method at various deposition condi...
Scanning electron microscopy with energy dispersive element microanalysis, X-ray structural analys...
The microstructure, the stresses, and the elemental composition of Ti-Al-Si-N gradient coatings are ...
A gradient magnetron-sputtered three-layer laminated Ti–Ni–Ti coating is formed by the method of rea...
The nanocrystalline gradient coatings system Ti-Al-Si-Cu-N were annealed in the temperature range of...
Using the method of microprobe analysis and transmission electron microscopy, the influence of obtai...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
A study of the structural and mechanical properties of nanocrystalline TiAlSiN gradient coatings dep...
The effect of the elemental composition of AlxSi1−xN coatings deposited on Cu substrates by magnetro...
Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, us...
Using such unique methods of analysis as slow positron beam (SPB), RBS, μ-PIXE (proton microbeam), X...
Current paper presents the results of investigating of nanostructured cathode arc vacuum evaporation...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Surface nanocrystallization (SNC) not only can provide an alternative approach to improving the surf...
Nanostructured thin-film coatings based on titanium nitride, doped with silicon, chromium and alumin...
The paper describes the nanostructured coatings produced by C-PVD method at various deposition condi...
Scanning electron microscopy with energy dispersive element microanalysis, X-ray structural analys...
The microstructure, the stresses, and the elemental composition of Ti-Al-Si-N gradient coatings are ...
A gradient magnetron-sputtered three-layer laminated Ti–Ni–Ti coating is formed by the method of rea...