International audienceThe composition, structure, microstructure, and properties of indium tin oxide films grown by pulsed laser deposition at room temperature and under vacuum were studied. The films are highly nonstoichiometric, with about 20 oxygen deficiency, and present a semiconductor behavior between 300 and 15 K, followed by a superconducting transition at about 7 K related to the presence of In or In-Sn nanoclusters embedded in a stoichiometric indium tin oxide matrix, i.e., nanocomposite films are formed by the phase separation of oxygen deficient metastable indium tin oxide. The solid-liquid and liquid-solid phase transitions of the metallic nanoclusters were evidenced by resistivity measurements in the 300 to 450 K range. The fi...
Effects of O2, N2, Ar and He on the formation of micro- and nanostructured indium tin oxide (ITO) th...
AbstractIndium tin oxide (ITO) thin films have been prepared by jet nebulizer spray pyrolysis techni...
The laser ablation method was used for depositing porous nanocrystalline indium-tin oxide thin films...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
The composition, structure, microstructure, and properties of indium tin oxide films grown by pulsed...
Indium oxide, tin oxide and indium tin oxide nanowires have been grown by vapor deposition on Si and...
A novel technique of layer-by-layer deposition of indium and tin by electron beam deposition and sub...
Indium tin oxide (ITO) nanocrystal rods were synthesized in-situ by a vapor-liquid-solid (VLS) metho...
385-393Transparent conducting tin oxide thin films (thickness ~140 nm) have been synthesized by usin...
A novel technique of layer-by-layer deposition of indium and tin by electron beam deposition and sub...
Indium tin oxide (ITO) thin films have been prepared by jet nebulizer spray pyrolysis technique for ...
Transparent conducting tin oxide thin films (thickness similar to 140 nm) have been synthesized by u...
Effects of O2, N2, Ar and He on the formation of micro- and nanostructured indium tin oxide (ITO) th...
AbstractIndium tin oxide (ITO) thin films have been prepared by jet nebulizer spray pyrolysis techni...
The laser ablation method was used for depositing porous nanocrystalline indium-tin oxide thin films...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
International audienceThe composition, structure, microstructure, and properties of indium tin oxide...
The composition, structure, microstructure, and properties of indium tin oxide films grown by pulsed...
Indium oxide, tin oxide and indium tin oxide nanowires have been grown by vapor deposition on Si and...
A novel technique of layer-by-layer deposition of indium and tin by electron beam deposition and sub...
Indium tin oxide (ITO) nanocrystal rods were synthesized in-situ by a vapor-liquid-solid (VLS) metho...
385-393Transparent conducting tin oxide thin films (thickness ~140 nm) have been synthesized by usin...
A novel technique of layer-by-layer deposition of indium and tin by electron beam deposition and sub...
Indium tin oxide (ITO) thin films have been prepared by jet nebulizer spray pyrolysis technique for ...
Transparent conducting tin oxide thin films (thickness similar to 140 nm) have been synthesized by u...
Effects of O2, N2, Ar and He on the formation of micro- and nanostructured indium tin oxide (ITO) th...
AbstractIndium tin oxide (ITO) thin films have been prepared by jet nebulizer spray pyrolysis techni...
The laser ablation method was used for depositing porous nanocrystalline indium-tin oxide thin films...