Introduction of hydrogen into titanium by plasma methods

The introduction of hydrogen into titanium VT1-0 by the methods of plasma-immersion ion implantation (PIII) from the hydrogen plasma of a source with a heated cathode and into high-frequency discharge (HFD) plasma was studied. Modes of installations for introduction are chosen proceeding from the requirement of the maximum content of hydrogen in the samples. It is established that saturation from the HFD-plasma leads to a significant enrichment to a depth of 1.2 µm, at the introduction of hydrogen by the PIII this depth is 0.6 µm. The hydrogen content of 0.06 wt.% in the samples after saturation in the HFD plasma, and 0.049 wt.% after PIII. During PIIII (with an energy of 0.9-1.5 keV), hydrogen is strongly scattered by the surface of the sample and is captured predominantly by surface defects (including those created by the ions themselves), as well as by vacancies in the near-surface layers. Upon saturation from the HFD-plasma, hydrogen diffuses into the interior of the sample and settles in interstices and at grain boundaries. At the same time, saturation from the HFD plasma and PIII lead to significant change in the crystal parameters and the creation of hydride phases