Journal ArticleA low-energy electron microscopy study of two-dimensional Si(001) island shapes near thermal equilibrium on 10315 mm2 large single-domain terraces reveals a continuous increase of island aspect ratio and a shape transition from elliptical to ‘‘American-football''-like with increasing island size. The size-dependent island shapes are driven by elastic relaxation caused by the intrinsic surface stress anisotropy present on Si(001). Analysis of the measured elliptical island shapes based on an elastic-model calculation allows a quantitative determination of step energies and of the surface stress anisotropy as a function of temperature
By exploiting the misfit strain of Ge on Si epitaxy, we examine the significant changes induced by s...
We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfac...
We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfac...
Journal ArticleWe show that the equilibrium shape anisotropy of two-dimensional islands in heteroepi...
The shape evolution and the effect of deposition temperature on the strain status of Ge/Si(100) isla...
The shape evolution and the effect of deposition temperature on the strain status of Ge/Si(100) isla...
The shape evolution and the effect of deposition temperature on the strain status of Ge/Si(100) isla...
Journal ArticleWe analyze Ge hut island formation on Si(001), using first-principles calculations of...
Abstract We investigate here the influence of Si substrate miscut on the strain and elastic energy o...
We report on the tailoring of the stress field distribution at the surface in a multilayered Ge/Si s...
We investigate the driving forces that determine the growth mode of heteroepitaxial Ge layers grown ...
The morphologies of self-assembled Ge/Si(001) islands with initial Si capping at a temperature of 64...
We investigate the driving forces that determine the growth mode of heteroepitaxial Ge layers grown ...
By exploiting the misfit strain of Ge on Si epitaxy, we examine the significant changes induced by s...
Self assembled silicon/germanium islands grown on silicon at high growth temperatures are investiga...
By exploiting the misfit strain of Ge on Si epitaxy, we examine the significant changes induced by s...
We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfac...
We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfac...
Journal ArticleWe show that the equilibrium shape anisotropy of two-dimensional islands in heteroepi...
The shape evolution and the effect of deposition temperature on the strain status of Ge/Si(100) isla...
The shape evolution and the effect of deposition temperature on the strain status of Ge/Si(100) isla...
The shape evolution and the effect of deposition temperature on the strain status of Ge/Si(100) isla...
Journal ArticleWe analyze Ge hut island formation on Si(001), using first-principles calculations of...
Abstract We investigate here the influence of Si substrate miscut on the strain and elastic energy o...
We report on the tailoring of the stress field distribution at the surface in a multilayered Ge/Si s...
We investigate the driving forces that determine the growth mode of heteroepitaxial Ge layers grown ...
The morphologies of self-assembled Ge/Si(001) islands with initial Si capping at a temperature of 64...
We investigate the driving forces that determine the growth mode of heteroepitaxial Ge layers grown ...
By exploiting the misfit strain of Ge on Si epitaxy, we examine the significant changes induced by s...
Self assembled silicon/germanium islands grown on silicon at high growth temperatures are investiga...
By exploiting the misfit strain of Ge on Si epitaxy, we examine the significant changes induced by s...
We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfac...
We examine the structure and the evolution of Ge islands epitaxially grown on vicinal Si(111) surfac...