Journal ArticleThe addition of surfactant nitrogen during the growth of GaInP on 001 GaAs substrates produces significant and interesting changes in the optical and morphological properties of GaInP. In particular, multiple peaks are seen in the low temperature photoluminescence (PL) spectra of GaInP/GaInP:N heterostructures. The origin of these multiple peaks is investigated using transmission electron microscopy, energy dispersive spectroscopy, and cathodoluminescence. It is found that a discontinuous In-rich layer forms at the GaInP/GaInP:N interface leading to a 1-6 nm thick GaInP layer that is 70% In and has a PL peak energy of 1.7 eV. Cross-sectional cathodoluminescence experiments confirm the existence and composition of the ...
Journal ArticleSamplen s of GaxIn1-xP grown by organometallic vapor phase epitaxy on (001) GaAs subs...
Journal ArticleGaAs:N is an interesting material for many devices due to its unique compositional va...
Journal ArticleThe incorporation of both dopants and background impurities during the organometallic...
Journal ArticleSignificant changes in microstructure, surface structure, and alloy composition have ...
Journal ArticleThe effect of the surfactant Sb has been studied for GaInP semiconductor alloys grown...
Journal ArticleCuPt ordering in GaInP has significant effects on the electrical and optical properti...
Journal ArticleA surfactant is used to induce an ordered structure in an epitaxial layer. The additi...
Journal ArticleThe use of surfactants to control specific aspects of the vapor-phase epitaxial growt...
Journal ArticleThe donor Te has been added to GaInP during organometallic vapor phase epitaxial grow...
Journal ArticleRecently, the addition of the isoelectronic surfactant Sb during organometallic vapor...
Journal ArticleThe surface structure of Ga0.52In0.48P was studied by surface photoabsorption. An abs...
Journal ArticleThe step structure and CuPt ordering in GaInP layers grown by organometallic vapor ph...
Journal ArticleEpitaxial layers of GaInP were grown by organometallic vapor phase epitaxy with small...
Journal ArticleHeterostructures and quantum wells can be produced in GaInP without changing the soli...
Journal ArticlePresents the results of a study of Zinc dopant effects on both step structure and ord...
Journal ArticleSamplen s of GaxIn1-xP grown by organometallic vapor phase epitaxy on (001) GaAs subs...
Journal ArticleGaAs:N is an interesting material for many devices due to its unique compositional va...
Journal ArticleThe incorporation of both dopants and background impurities during the organometallic...
Journal ArticleSignificant changes in microstructure, surface structure, and alloy composition have ...
Journal ArticleThe effect of the surfactant Sb has been studied for GaInP semiconductor alloys grown...
Journal ArticleCuPt ordering in GaInP has significant effects on the electrical and optical properti...
Journal ArticleA surfactant is used to induce an ordered structure in an epitaxial layer. The additi...
Journal ArticleThe use of surfactants to control specific aspects of the vapor-phase epitaxial growt...
Journal ArticleThe donor Te has been added to GaInP during organometallic vapor phase epitaxial grow...
Journal ArticleRecently, the addition of the isoelectronic surfactant Sb during organometallic vapor...
Journal ArticleThe surface structure of Ga0.52In0.48P was studied by surface photoabsorption. An abs...
Journal ArticleThe step structure and CuPt ordering in GaInP layers grown by organometallic vapor ph...
Journal ArticleEpitaxial layers of GaInP were grown by organometallic vapor phase epitaxy with small...
Journal ArticleHeterostructures and quantum wells can be produced in GaInP without changing the soli...
Journal ArticlePresents the results of a study of Zinc dopant effects on both step structure and ord...
Journal ArticleSamplen s of GaxIn1-xP grown by organometallic vapor phase epitaxy on (001) GaAs subs...
Journal ArticleGaAs:N is an interesting material for many devices due to its unique compositional va...
Journal ArticleThe incorporation of both dopants and background impurities during the organometallic...