Modelling and Study of a Microwave Plasma Source for High-rate Etching

[EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in order to investigate the microwave coupling into the plasma chamber and the microwave field distribution as well as the plasma itself. Different examples of FEM-based microwave simulations at different conditions and their experimental validations will be presented.Pauly, S.; Schulz, A.; Walker, M.; Gorath, K.; Baumgärtner, K.; Tovar, G. (2019). Modelling and Study of a Microwave Plasma Source for High-rate Etching. En AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating. Editorial Universitat Politècnica de València. 35-42. https://doi.org/10.4995/AMPERE2019.2019.9757354