W–S–C films were deposited by magnetron sputtering in an Ar atmosphere with a Ti interlayer. A carbon target with several pellets of WS2 incrusted in the zone of the preferential erosion was used. The number of pellets was changed to modify the carbon content in the films, which varied from 29 up to 70 at%. Doping W–S films with carbon led to a substantial increase of the hardness in the range 4–10 GPa; the maximum of hardness was obtained for coatings with the carbon content of 40 at%. X-ray diffraction (XRD) patterns showed that there was a loss of crystallinity with the increase of the carbon content in the film.The coatings were tested by pin-on-disk from room temperature (RT) up to 400 °C. At RT, the friction coefficient was in the ran...
WSeC coatings were deposited by co-sputtering from WSe2 and C targets. Carbon content varied from 25...
W-S-N films were deposited by reactive magnetron sputtering from WS2 target in Ar/N2 atmosphere. Bes...
WSxC(H) coatings were deposited on single crystal silicon(100) wafers by magnetron co-sputtering and...
W-S-C films were deposited by non-reactive magnetron sputtering from a carbon target with several pe...
W-S-C thin films were deposited by magnetron sputtering in a semi-industrial deposition unit. Variou...
W-S-C films were deposited by non-reactive magnetron sputtering from a carbon target with several pe...
Carbon-alloyed transition metal dichalcogenide (TMD) coatings have great potential for providing a ...
WS2/a-C coatings with various carbon contents (0-65 at.%) were deposited on silicon wafers by magnet...
Layered transition metal dichalcogenides (TMD) such as WS2 are materials well-known for their solid ...
This work aimed at studying the effect of a Ti interlayer and the alloying with carbon and nitrogen ...
Transition metal dichalcogenides (TMD) have been one of the best alternatives as low friction coatin...
Mechanical properties of r.f. reactive magnetron-sputtered tungsten carbide films prepared in the su...
Parameters for the deposition of diamond-like carbon thin films using a hybrid magnetron sputter/pla...
In this study, WC (tungsten carbide) thin films were deposited on high-speed steel (AISI M2) and Si ...
Mo-W-C coatings with three different C/(Mo+W) ratios (5:1, 2.8:1 and 2.2:1) were deposited by using ...
WSeC coatings were deposited by co-sputtering from WSe2 and C targets. Carbon content varied from 25...
W-S-N films were deposited by reactive magnetron sputtering from WS2 target in Ar/N2 atmosphere. Bes...
WSxC(H) coatings were deposited on single crystal silicon(100) wafers by magnetron co-sputtering and...
W-S-C films were deposited by non-reactive magnetron sputtering from a carbon target with several pe...
W-S-C thin films were deposited by magnetron sputtering in a semi-industrial deposition unit. Variou...
W-S-C films were deposited by non-reactive magnetron sputtering from a carbon target with several pe...
Carbon-alloyed transition metal dichalcogenide (TMD) coatings have great potential for providing a ...
WS2/a-C coatings with various carbon contents (0-65 at.%) were deposited on silicon wafers by magnet...
Layered transition metal dichalcogenides (TMD) such as WS2 are materials well-known for their solid ...
This work aimed at studying the effect of a Ti interlayer and the alloying with carbon and nitrogen ...
Transition metal dichalcogenides (TMD) have been one of the best alternatives as low friction coatin...
Mechanical properties of r.f. reactive magnetron-sputtered tungsten carbide films prepared in the su...
Parameters for the deposition of diamond-like carbon thin films using a hybrid magnetron sputter/pla...
In this study, WC (tungsten carbide) thin films were deposited on high-speed steel (AISI M2) and Si ...
Mo-W-C coatings with three different C/(Mo+W) ratios (5:1, 2.8:1 and 2.2:1) were deposited by using ...
WSeC coatings were deposited by co-sputtering from WSe2 and C targets. Carbon content varied from 25...
W-S-N films were deposited by reactive magnetron sputtering from WS2 target in Ar/N2 atmosphere. Bes...
WSxC(H) coatings were deposited on single crystal silicon(100) wafers by magnetron co-sputtering and...