Mechanical and tribological characterization of CNx films deposited by d.c. magnetron sputtering

Carbon nitride (CNx) thin films were deposited onto silicon and steel substrates at 400 °C from a carbon target by d.c. magnetron sputtering system. The composition, structural, and mechanical properties of deposited films were investigated as a function of argon/nitrogen concentration and sputtering power, by means of Energy Dispersive X-ray Spectroscopy (EDS), Fourier Transform Infrared Spectroscopy (FTIR), Raman Spectroscopy (RS), and nanoindentation. The EDS and Elastic Forward Analysis (EFA) showed that the nitrogen concentration in the CNx deposited films varied between 16% and 28% at depending on nitrogen concentrations in argon/nitrogen gas mixture, and deposition power. FTIR analysis indicated the presence of 2266 and 2278 cm–1 stretching peaks associated with CN triple bonds of nitriles and isocyanides, 1640 cm–1 and 1545 cm–1 associated with the C=C and C=N bonds. The thickness of the CNx deposited films varied between 0.4 and 0.8 µm at different sputtering powers. The hardness and Young's modulus were investigated by depth sensing nanoindentation method. The obtained hardness and Young's modulus increased from 4 to 17 GPa, and from 50 to 170 GPa, respectively; when the nitrogen content in the deposited films diminished between 28 and 12%. On the other hand, the friction and wear tests were done using a pin-on-disc tribometer. The friction tests showed values of 0.05 and 0.4 in dry air and humid atmosphere; respectively