This work presents the structural evolution of nanocomposite CrCx∕a-C:H coatings prepared by unbalanced magnetron sputtering of a metallic Cr target in Ar+CH4 glow discharges using low negative dc bias voltages. Raman spectroscopy and x-ray photoelectron spectroscopy were used to characterize the phase composition and the chemical bonding in the films deposited at different experimental conditions. The results were correlated to the chemical composition obtained by elastic recoil detection analysis. The coating microstructure was investigated on selected samples by high-resolution transmission electron microscopy combined with electron energy-loss spectroscopy analysis. The nanocomposite coatings can be divided into hard CrCx dominated film...
Low friction C/Cr coatings have been successfully deposited by the combined steered cathodic arc/unb...
Coating growth and mechanical properties of nanolamellar Cr2AlC coatings at various sputtering power...
This paper focuses on the influence of the High Power Pulsed Magnetron Sputtering (HPPMS) and Direct...
Cr–C/Ag thin films with 0–14 at.% Ag have been deposited by magnetron sputtering from elemental targ...
AbstractCr–C/Ag thin films with 0–14at.% Ag have been deposited by magnetron sputtering from element...
Cr-C/Ag thin films with 0-14 at% Ag have been deposited by magnetron sputtering from elemental targe...
A C/CrC coating was deposited by unbalanced magnetron sputtering of graphite and Cr metal targets in...
C/Cr coatings were prepared by the combined steered cathodic arc/unbalanced magnetron sputtering tec...
The paper discusses the effect of ion irradiation on a new type of nanoscale multilayer structure in...
Nanocomposite films consisting of a hard nano-crystalline chromium carbide phase and amorphous carbo...
MAX phases (M = transition metal, A = A-group element, and X = C/N) are of special interest because ...
A magnetron sputtered amorphous Cr-B-C thin film was investigated by means of atom probe tomography ...
Nanocomposite coatings of CrN–WS2 were prepared at different Cr contents (approximately 8–39 at%)usi...
AbstractChromium carbide films with different phase contents were deposited at 126±26°C by industria...
Chromium carbide films with different phase contents were deposited at 126±26 °C by industrial high ...
Low friction C/Cr coatings have been successfully deposited by the combined steered cathodic arc/unb...
Coating growth and mechanical properties of nanolamellar Cr2AlC coatings at various sputtering power...
This paper focuses on the influence of the High Power Pulsed Magnetron Sputtering (HPPMS) and Direct...
Cr–C/Ag thin films with 0–14 at.% Ag have been deposited by magnetron sputtering from elemental targ...
AbstractCr–C/Ag thin films with 0–14at.% Ag have been deposited by magnetron sputtering from element...
Cr-C/Ag thin films with 0-14 at% Ag have been deposited by magnetron sputtering from elemental targe...
A C/CrC coating was deposited by unbalanced magnetron sputtering of graphite and Cr metal targets in...
C/Cr coatings were prepared by the combined steered cathodic arc/unbalanced magnetron sputtering tec...
The paper discusses the effect of ion irradiation on a new type of nanoscale multilayer structure in...
Nanocomposite films consisting of a hard nano-crystalline chromium carbide phase and amorphous carbo...
MAX phases (M = transition metal, A = A-group element, and X = C/N) are of special interest because ...
A magnetron sputtered amorphous Cr-B-C thin film was investigated by means of atom probe tomography ...
Nanocomposite coatings of CrN–WS2 were prepared at different Cr contents (approximately 8–39 at%)usi...
AbstractChromium carbide films with different phase contents were deposited at 126±26°C by industria...
Chromium carbide films with different phase contents were deposited at 126±26 °C by industrial high ...
Low friction C/Cr coatings have been successfully deposited by the combined steered cathodic arc/unb...
Coating growth and mechanical properties of nanolamellar Cr2AlC coatings at various sputtering power...
This paper focuses on the influence of the High Power Pulsed Magnetron Sputtering (HPPMS) and Direct...