In photovoltaics (PV) and microelectronics, there is an ongoing need for fabrication of silicon thin films with excellent material properties and with minimum production cost at the same time. To overcome fabrication gaps we present reached results for depositing silicon thin films by crucible-free electron beam physical vapor deposition (EB-PVD) and for plasma pretreatment of the substrates. The crucible-free EB-PVD process could be improved regarding critical aspects, e.g. occurrence of ingot cracks during heating up of monocrystalline Si evaporation material and spill out of the Si melt on the melting pool edges. Deposition rates above 500 nm/s, corresponding to 30 μm/min, have been reached. Relating heat fluxes will be presented and dis...
The applicability of the very high frequency (VHF) plasma-enhanced chemical vapor deposition (PECVD)...
In this paper we report on homoepitaxial growth of Si thin films at substrate temperatures Ts 500 65...
This paper presents a low cost application of high-temperature silicon CVD depositions for photovolt...
In photovoltaics (PV) and microelectronics, there is anongoing need for fabrication of silicon thin ...
We demonstrate currently reached results for depositing silicon thin films by crucible-free electron...
In earlier electron beam physical vapor deposition tests (EB-PVD), using a conventional copper cruci...
High rate silicon vacuum deposition by electron beam evaporation is very attractive because of econo...
Using electron beam evaporation for the production of polycrystalline silicon (pc-Si) thin-film sola...
Polycrystalline silicon poly Si thin films have the potential to overcome the limits of today s si...
Photovoltaics is likely to become one of the world major energy sources in the future providing it i...
We assess the use of electron beam physical vapor deposition EB PVD for the deposition of silicon ...
In this work, we present the structural and the electrical qualities of thin Si films which are homo...
A high rate low temperature PECVD process for deposition of silicon films from trichlorosilane with ...
We fabricate thin epitaxial crystal silicon solar cells on display glass and fused silica substrates...
This paper investigates the crystallinity, microstructure, surface morphology, stress characteristic...
The applicability of the very high frequency (VHF) plasma-enhanced chemical vapor deposition (PECVD)...
In this paper we report on homoepitaxial growth of Si thin films at substrate temperatures Ts 500 65...
This paper presents a low cost application of high-temperature silicon CVD depositions for photovolt...
In photovoltaics (PV) and microelectronics, there is anongoing need for fabrication of silicon thin ...
We demonstrate currently reached results for depositing silicon thin films by crucible-free electron...
In earlier electron beam physical vapor deposition tests (EB-PVD), using a conventional copper cruci...
High rate silicon vacuum deposition by electron beam evaporation is very attractive because of econo...
Using electron beam evaporation for the production of polycrystalline silicon (pc-Si) thin-film sola...
Polycrystalline silicon poly Si thin films have the potential to overcome the limits of today s si...
Photovoltaics is likely to become one of the world major energy sources in the future providing it i...
We assess the use of electron beam physical vapor deposition EB PVD for the deposition of silicon ...
In this work, we present the structural and the electrical qualities of thin Si films which are homo...
A high rate low temperature PECVD process for deposition of silicon films from trichlorosilane with ...
We fabricate thin epitaxial crystal silicon solar cells on display glass and fused silica substrates...
This paper investigates the crystallinity, microstructure, surface morphology, stress characteristic...
The applicability of the very high frequency (VHF) plasma-enhanced chemical vapor deposition (PECVD)...
In this paper we report on homoepitaxial growth of Si thin films at substrate temperatures Ts 500 65...
This paper presents a low cost application of high-temperature silicon CVD depositions for photovolt...