Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Optical emission spectroscopy (OES) combined with the models of plasma light emission becomes nonint...
The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron...
Plasma Characterization Using Optical Emission Spectroscopy Abstract Magnetron sputtering is a w...
Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using...
In this paper, we investigate the basic characteristics of "magnetron sputtering plasma" using th...
Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using...
International audienceIn a dc-magnetron discharge with argon feed gas, densities of copper atoms in ...
A diagnostic complex based on a magnetron sputtering device is proposed for studying a magnetron dis...
This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means o...
The application of high power pulses with peak voltage of −2 kV and peak power density of 3 kW cm−2 ...
Schulte J, Sobe G, Reiss G. A linear model for the interpretation of optical emission spectroscopy m...
The magnetron is a weakly magnetised plasma source used for physical vapour deposition to produce hi...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Optical emission spectroscopy (OES) combined with the models of plasma light emission becomes nonint...
The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron...
Plasma Characterization Using Optical Emission Spectroscopy Abstract Magnetron sputtering is a w...
Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using...
In this paper, we investigate the basic characteristics of "magnetron sputtering plasma" using th...
Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using...
International audienceIn a dc-magnetron discharge with argon feed gas, densities of copper atoms in ...
A diagnostic complex based on a magnetron sputtering device is proposed for studying a magnetron dis...
This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means o...
The application of high power pulses with peak voltage of −2 kV and peak power density of 3 kW cm−2 ...
Schulte J, Sobe G, Reiss G. A linear model for the interpretation of optical emission spectroscopy m...
The magnetron is a weakly magnetised plasma source used for physical vapour deposition to produce hi...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias...