The optical absorption line is 1s₁- 2p₀ at the absorption spectrum of arsenic doped silicon has been studied for various arsenic concentrations at four temperatures. The concentrations are .9 x 10¹⁵ cm⁻³, 1.7 x 10¹⁵ cm⁻³, 4.0 x 10¹⁵ cm⁻³ and 1.5 x 10¹⁶ cm⁻³, the temperatures are 4.2°K, 53°K, 77°K, and 90°K. Spectrometer broadening was accounted for in the observed line-widths. There was observed two temperature independent broadening mechanisms, concentration and strain broadening. Two temperature dependent broadening mechanisms were observed, phonon broadening and the statistical Stark effect. The five, broadening mechanisms are believed to account for the total line-width through the use of the Voigt analysis half-breadth method. A shift...
A method is presented, based on photothermal ionization spectroscopy (PTIS), for determining the sha...
Infrared absorptance measurements of polycrystalline silicon and single crystals of silicon having o...
The current research demonstrates the effectiveness of silicon as a transmissive material for use wi...
The optical absorption line is 1s₁- 2p₀ at the absorption spectrum of arsenic doped silicon has been...
In boron-doped silicon, optical absorption takes place through the excitation of bound holes from th...
A high resolution infrared absorption study of silicon samples doped with sulphur by implantation an...
The absorption spectrum of In acceptor in silicon has been measured under negligible concentration b...
The diffusion of ion- implanted arsenic in thermally grown silicon dioxide is examined as a function...
N-type silicon-doped epitaxial layers of gallium arsenide grown by molecular-beam epitaxy (MBE) or m...
In uncompensated phosphorus or arsenic-doped silicon, observation of the shallow, donor absorption l...
[[abstract]]We report the effects of annealing temperature on the near-band-gap transmittance, the a...
The temperature dependence of the optical properties for amorphous silicon is studied at wavelengths...
AbstractLow-temperature FTIR spectroscopy is further developed to be applicable to measure the alumi...
Infrared absorption spectra of impurities and radiation damage in silicon semiconductor
A fast and sensitive method for measurement of spectral dependence of the optical absorption coeffic...
A method is presented, based on photothermal ionization spectroscopy (PTIS), for determining the sha...
Infrared absorptance measurements of polycrystalline silicon and single crystals of silicon having o...
The current research demonstrates the effectiveness of silicon as a transmissive material for use wi...
The optical absorption line is 1s₁- 2p₀ at the absorption spectrum of arsenic doped silicon has been...
In boron-doped silicon, optical absorption takes place through the excitation of bound holes from th...
A high resolution infrared absorption study of silicon samples doped with sulphur by implantation an...
The absorption spectrum of In acceptor in silicon has been measured under negligible concentration b...
The diffusion of ion- implanted arsenic in thermally grown silicon dioxide is examined as a function...
N-type silicon-doped epitaxial layers of gallium arsenide grown by molecular-beam epitaxy (MBE) or m...
In uncompensated phosphorus or arsenic-doped silicon, observation of the shallow, donor absorption l...
[[abstract]]We report the effects of annealing temperature on the near-band-gap transmittance, the a...
The temperature dependence of the optical properties for amorphous silicon is studied at wavelengths...
AbstractLow-temperature FTIR spectroscopy is further developed to be applicable to measure the alumi...
Infrared absorption spectra of impurities and radiation damage in silicon semiconductor
A fast and sensitive method for measurement of spectral dependence of the optical absorption coeffic...
A method is presented, based on photothermal ionization spectroscopy (PTIS), for determining the sha...
Infrared absorptance measurements of polycrystalline silicon and single crystals of silicon having o...
The current research demonstrates the effectiveness of silicon as a transmissive material for use wi...