Thermoelectric properties improvement in Mg2Sn thin films by structural modification

International audienceMg-Sn thin films (21 ≤ at. % Sn ≤ 42.5) were deposited by magnetron sputtering in the argon atmosphere. The structure and morphology of the films were characterized as a function of the composition. Mg2Sn structure was changed from stable face-centered cubic to metastable orthorhombic structure while the content of Sn in the films increased. The influence of this structural modification on thermoelectric properties was discussed in a wide range of temperatures (30–200 °C). The film carrier concentration and mobility were measured to explain the electronic transport behavior as a function of the film structural modifications. The maximum figure of merit ZT ≈ 0.26 at 200 °C was reached for the film with 36 at. % Sn while a mixture of cubic and orthorhombic Mg2Sn structures coexisted. An annealing treatment was performed under vacuum (∼10−4 Pa) at different temperatures (up to 600 °C) to determine the limit of structural and morphological stability of this film