Abstract X-ray photoelectron spectroscopy has been used to measure the valence band offset of the InN/BaTiO3 heterojunction. It is found that a type-I band alignment forms at the interface. The valence band offset (VBO) and conduction band offset (CBO) are determined to be 2.25 ± 0.09 and 0.15 ± 0.09 eV, respectively. The experimental VBO data is well consistent with the value that comes from transitivity rule. The accurate determination of VBO and CBO is important for use of semiconductor/ferrroelectric heterojunction multifunctional devices.</p
The valence band offset of wurtzite-InN/AlN (0001) heterojunctions is determined by x-ray photoelect...
The valence band offset (VBO) at the interface between indium nitride (InN) and selected oxide mater...
High-resolution x-ray photoemission spectroscopy measurements are used to determine the valence band...
X-ray photoelectron spectroscopy has been used to measure the valence band offset of the InN/BaTiO3 ...
The valence band offset (VBO) of the InN/GaAs heterojunction is directly determined by x-ray photoel...
The valence band offset(VBO) of wurtzite indium nitride/strontium titanate(InN/SrTiO3) heterojunctio...
X-ray photoelectron spectroscopy has been used to measure the valence band offset of the ZnO/BaTiO3 ...
The valence band offset (VBO) of the wurtzite InN/ZnO heterojunction is directly determined by x-ray...
The valence band offset (VBO) of InN/4H-SiC heterojunction has been directly measured by x-ray photo...
X-ray photoelectron spectroscopy has been used to measure the valence band offset (VBO) of the w-InN...
The valence band offset (VBO) at a InN/In(0.3)Ga0.7N(0001) as well as HfO(2)/InN(0001) heterojunctio...
MgO may be a promising gate dielectric and surface passivation film for InN based devices and the va...
The band offsets in InN/p-Si heterojunctions are determined by high resolution x-ray photoemission s...
InN layers were directly grown on Ge substrate by plasma-assisted molecular beam epitaxy (PAMBE). Th...
In2O3 is a promising partner of InN to form InN/In2O3 heterosystems. The valence band offset (VBO) o...
The valence band offset of wurtzite-InN/AlN (0001) heterojunctions is determined by x-ray photoelect...
The valence band offset (VBO) at the interface between indium nitride (InN) and selected oxide mater...
High-resolution x-ray photoemission spectroscopy measurements are used to determine the valence band...
X-ray photoelectron spectroscopy has been used to measure the valence band offset of the InN/BaTiO3 ...
The valence band offset (VBO) of the InN/GaAs heterojunction is directly determined by x-ray photoel...
The valence band offset(VBO) of wurtzite indium nitride/strontium titanate(InN/SrTiO3) heterojunctio...
X-ray photoelectron spectroscopy has been used to measure the valence band offset of the ZnO/BaTiO3 ...
The valence band offset (VBO) of the wurtzite InN/ZnO heterojunction is directly determined by x-ray...
The valence band offset (VBO) of InN/4H-SiC heterojunction has been directly measured by x-ray photo...
X-ray photoelectron spectroscopy has been used to measure the valence band offset (VBO) of the w-InN...
The valence band offset (VBO) at a InN/In(0.3)Ga0.7N(0001) as well as HfO(2)/InN(0001) heterojunctio...
MgO may be a promising gate dielectric and surface passivation film for InN based devices and the va...
The band offsets in InN/p-Si heterojunctions are determined by high resolution x-ray photoemission s...
InN layers were directly grown on Ge substrate by plasma-assisted molecular beam epitaxy (PAMBE). Th...
In2O3 is a promising partner of InN to form InN/In2O3 heterosystems. The valence band offset (VBO) o...
The valence band offset of wurtzite-InN/AlN (0001) heterojunctions is determined by x-ray photoelect...
The valence band offset (VBO) at the interface between indium nitride (InN) and selected oxide mater...
High-resolution x-ray photoemission spectroscopy measurements are used to determine the valence band...