Abstract Catalyst-free, vertical array of InAs nanowires (NWs) are grown on Si (111) substrate using MOCVD technique. The as-grown InAs NWs show a zinc-blende crystal structure along a < 111 > direction. It is found that both the density and length of InAs NWs decrease with increasing growth temperatures, while the diameter increases with increasing growth temperature, suggesting that the catalyst-free growth of InAs NWs is governed by the nucleation kinetics. The longitudinal optical and transverse optical (TO) mode of InAs NWs present a phonon frequency slightly lower than those of InAs bulk materials, which are speculated to be caused by the defects in the NWs. A surface optical mode is also observed for the InAs NWs, which shifts ...
International audienceWe report on the selective area growth of InAs nanowires (NWs) by the catalyst...
International audienceWe report on the selective area growth of InAs nanowires (NWs) by the catalyst...
Development of heteroepitaxy growth of catalyst-free vertical III-V nanowires on Si wafers is highly...
Catalyst-free, vertical array of InAs nanowires (NWs) are grown on Si (111) substrate using MOCVD te...
Catalyst-free, vertical array of InAs nanowires (NWs) are grown on Si (111) substrate using MOCVD te...
The effect of molecular beam epitaxy parameters on catalyst-free growth of InAs nanowires using oxid...
We investigate a growth mechanism which allows for the fabrication of catalyst-free InAs nanowires o...
We report self-induced growth of vertically aligned (i.e. along the [ 111] direction), free-st...
International audienceWe report for the first time on the hydride vapor phase epitaxy (HVPE) growth ...
International audienceWe report for the first time on the hydride vapor phase epitaxy (HVPE) growth ...
We successfully grow high-quality wurtzite InAs nanowires on GaAs substrates. The influences of grow...
International audienceA CMOS compatible process is presented in order to grow self-catalyzed InAs na...
International audienceA CMOS compatible process is presented in order to grow self-catalyzed InAs na...
Crystal structure and defects have been shown to have a strong impact on III-V nanowire properties. ...
We report on he growth of single crystal InAs nanowires on Si/SiOx substrates by chemical vapor depo...
International audienceWe report on the selective area growth of InAs nanowires (NWs) by the catalyst...
International audienceWe report on the selective area growth of InAs nanowires (NWs) by the catalyst...
Development of heteroepitaxy growth of catalyst-free vertical III-V nanowires on Si wafers is highly...
Catalyst-free, vertical array of InAs nanowires (NWs) are grown on Si (111) substrate using MOCVD te...
Catalyst-free, vertical array of InAs nanowires (NWs) are grown on Si (111) substrate using MOCVD te...
The effect of molecular beam epitaxy parameters on catalyst-free growth of InAs nanowires using oxid...
We investigate a growth mechanism which allows for the fabrication of catalyst-free InAs nanowires o...
We report self-induced growth of vertically aligned (i.e. along the [ 111] direction), free-st...
International audienceWe report for the first time on the hydride vapor phase epitaxy (HVPE) growth ...
International audienceWe report for the first time on the hydride vapor phase epitaxy (HVPE) growth ...
We successfully grow high-quality wurtzite InAs nanowires on GaAs substrates. The influences of grow...
International audienceA CMOS compatible process is presented in order to grow self-catalyzed InAs na...
International audienceA CMOS compatible process is presented in order to grow self-catalyzed InAs na...
Crystal structure and defects have been shown to have a strong impact on III-V nanowire properties. ...
We report on he growth of single crystal InAs nanowires on Si/SiOx substrates by chemical vapor depo...
International audienceWe report on the selective area growth of InAs nanowires (NWs) by the catalyst...
International audienceWe report on the selective area growth of InAs nanowires (NWs) by the catalyst...
Development of heteroepitaxy growth of catalyst-free vertical III-V nanowires on Si wafers is highly...