Tin-doped Indium oxide (ITO) thin films were prepared by sol-gel dip-coating technique using low-cost metal salts and organic solvents. The coated films were treated without annealing or annealed at 400°C and 600°C in 3% H2/97% N2 mixtures atmosphere. Microstructure, optical, and electrical properties of the prepared ITO films were investigated in detail. The maximum transmittance in the visible range (380–780 nm) is 85.6%, and the best resistivity is 5×10−2 Ω-cm when annealed at 600°C in 3% H2/97% N2 mixtures atmosphere. It is found that the optical and electrical properties of the prepared ITO films are strongly related to the microstructure variation. The organic compounds could not be removed completely, and the prepared ITO thin films ...
Indium tin oxide (ITO) is widely utilized in numerous industrial applications due to its unique comb...
The transparent conducting indium tin oxide (ITO) thin films were prepared by sol-gel and spin coati...
Indium-tin oxide films are deposited by low plasma temperature RF sputtering on highly flexible modi...
Abstract: Indium tin oxide (ITO) thin films have been prepared using the reactive evaporation techni...
The transparent conducting indium tin oxide (ITO) thin films were prepared by sol-gel and spin coati...
International audienceTransparent indium tin oxide (ITO) thin films have been deposited by the dip-c...
Indium tin oxide (ITO) thin films have been prepared using the reactive evaporation technique on gla...
Indium tin oxide (ITO) thin films were formed on glass substrates by sol-gel method. Coating sols we...
Indium tin oxide (ITO) thin films have been prepared on glass substrate using sol-gel spin-coating t...
<div><p>Conductive thin films have various applications in different technological fields. Indium ti...
ITO thin films were prepared by electron beam evaporation of ceramic ITO target. The films were subs...
Polycrystalline tin-doped indium oxide (ITO) thin films were prepared by pulsed laser deposition (PL...
The tin-doped indium oxide (ITO) thin films were prepared by reactive thermal evaporation on the gla...
Tin doped indium oxide thin films were prepared on glass substrates kept at room temperature, by act...
Indium-tin-oxide (ITO) is a transparent conducting material which is deposited as a thin film on gla...
Indium tin oxide (ITO) is widely utilized in numerous industrial applications due to its unique comb...
The transparent conducting indium tin oxide (ITO) thin films were prepared by sol-gel and spin coati...
Indium-tin oxide films are deposited by low plasma temperature RF sputtering on highly flexible modi...
Abstract: Indium tin oxide (ITO) thin films have been prepared using the reactive evaporation techni...
The transparent conducting indium tin oxide (ITO) thin films were prepared by sol-gel and spin coati...
International audienceTransparent indium tin oxide (ITO) thin films have been deposited by the dip-c...
Indium tin oxide (ITO) thin films have been prepared using the reactive evaporation technique on gla...
Indium tin oxide (ITO) thin films were formed on glass substrates by sol-gel method. Coating sols we...
Indium tin oxide (ITO) thin films have been prepared on glass substrate using sol-gel spin-coating t...
<div><p>Conductive thin films have various applications in different technological fields. Indium ti...
ITO thin films were prepared by electron beam evaporation of ceramic ITO target. The films were subs...
Polycrystalline tin-doped indium oxide (ITO) thin films were prepared by pulsed laser deposition (PL...
The tin-doped indium oxide (ITO) thin films were prepared by reactive thermal evaporation on the gla...
Tin doped indium oxide thin films were prepared on glass substrates kept at room temperature, by act...
Indium-tin-oxide (ITO) is a transparent conducting material which is deposited as a thin film on gla...
Indium tin oxide (ITO) is widely utilized in numerous industrial applications due to its unique comb...
The transparent conducting indium tin oxide (ITO) thin films were prepared by sol-gel and spin coati...
Indium-tin oxide films are deposited by low plasma temperature RF sputtering on highly flexible modi...