Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films
- M. Vahidi
- J. A. Gifford
- S. K. Zhang
- S. Krishnamurthy
- Z. G. Yu
- L. Yu
- M. Huang
- C. Youngbull
- T. Y. Chen
- N. Newman
DOIAbstract
Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates
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